2015
DOI: 10.1002/pssa.201532206
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Electrical activity of (100) n‐type diamond with full donor site incorporation of phosphorus

Abstract: International audienceIn a previous work, we discovered a new set of growth parameters for fabricating (100) homoepitaxial phosphorus-doped n-type diamond with unique properties: full incorporation of phosphorus donors in substitutional sites together with a low surface roughness. In this work, a planar type Schottky barrier diode has been fabricated on the epilayer and C–V characteristics were measured. From the capacitance properties, the net donor density and the Schottky barrier height were experimentally … Show more

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Cited by 18 publications
(15 citation statements)
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“…The growth was performed in a home‐made MPCVD reactor described elsewhere, used for the growth on the (100) orientation with tertiarybutyl‐phosphine (TBP) as a dopant source. The incorporation ratio of phosphorus being much lower on (100) than on (111) surfaces, the phosphorus doping on (100) requires high amounts of TBP which induces a high residual content of phosphorus in layers grown on the (111)‐orientation. This contamination problem is the reason why the phosphorus doping of diamond usually requires two growth reactors: one dedicated to low TBP pressure, suited to the (111) orientation, and another one dedicated to high TBP pressures, suited to the (100) orientation.…”
Section: Methodsmentioning
confidence: 99%
“…The growth was performed in a home‐made MPCVD reactor described elsewhere, used for the growth on the (100) orientation with tertiarybutyl‐phosphine (TBP) as a dopant source. The incorporation ratio of phosphorus being much lower on (100) than on (111) surfaces, the phosphorus doping on (100) requires high amounts of TBP which induces a high residual content of phosphorus in layers grown on the (111)‐orientation. This contamination problem is the reason why the phosphorus doping of diamond usually requires two growth reactors: one dedicated to low TBP pressure, suited to the (111) orientation, and another one dedicated to high TBP pressures, suited to the (100) orientation.…”
Section: Methodsmentioning
confidence: 99%
“…The rate of incorporation in donor sites NnormalD/true[Ptrue] has been a determinant experimental parameter to identify the narrow windows of epitaxy conditions (surface desorientation, true[Ctrue]/true[H2true], temperature, etc.) giving NnormalD/true[Ptrue]100% on (100) surfaces . Figure illustrates the continous progress achieved since the beginning of the phosphorus doping on (100)‐oriented diamond at GEMaC.…”
Section: Recombination Processesmentioning
confidence: 99%
“…The low-index (100) plane is one of the most frequently obtained surface planes in CVD-grown diamond. In addition, the (100) epitaxial layers are generally believed to have a better electronic quality than their surface (111) equivalent [26]. The purpose with the present study has therefore been to theoretically investigate the combined effect by P-doping and surface termination on the energetics, and especially the electronic structure, of the diamond (100) surface.…”
Section: Introductionmentioning
confidence: 99%