1999
DOI: 10.1116/1.590819
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Electric force microscopy of induced charges and surface potentials in GaN modified by light and strain

Abstract: We have studied molecular beam epitaxy grown GaN films using electric force microscopy to detect sub-1 m regions of electric field gradient and surface potential variations associated with GaN extended defects. The large piezoelectric coefficients of GaN together with strain introduced by crystalline imperfections produce variation in piezoelectrically induced electric fields around these defects. The consequent spatial rearrangement of charges can be detected by electrostatic force microscopy, and can be addi… Show more

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Cited by 8 publications
(9 citation statements)
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“…5, EFM has been advanced by including the effect of a laser beam in GaN. Surface potential can be measured by adjusting the V 0 on the tip so that the tip experiences a minimum force F from the sample.…”
Section: Sample and Experimental Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…5, EFM has been advanced by including the effect of a laser beam in GaN. Surface potential can be measured by adjusting the V 0 on the tip so that the tip experiences a minimum force F from the sample.…”
Section: Sample and Experimental Methodsmentioning
confidence: 99%
“…4,5 However, one of the drawbacks is that the SEFM technique cannot tell us where the energy levels of the detected charges are. Scanning probe microscopy has become an important characterization technique for semiconductors in general.…”
Section: Introductionmentioning
confidence: 99%
“…Fluorescent nanoparticles fi nd wide applications in labeling and tagging, in particular in biomedical research, as a replacement for the commonly used molecular organic fl uorophores. [1][2][3][4][5][6] A relatively large surface area of nanoparticles potentially allows functionalizing with multiple tagging molecules. Furthermore, fl uorescence of a single fl uorescent nanoparticle is typically brighter than from a single dye molecule.…”
Section: Introductionmentioning
confidence: 99%
“…KPFM has been used to measure surface (contact) potentials [18][19][20][21][22][23][24][25][26][27][28][29][30][31][32][33][34][35][36] as a function of polarity, doping and surface treatment, surface band bending [22], and bare surface barrier heights [24] of III-nitrides. The measurement of these electronic properties is critical for designing devices based on III-nitrides.…”
Section: Characterization Of Surface Electronic Properties By Spmmentioning
confidence: 99%
“…They employed scanning capacitance microscopy (SCM) to investigate threading dislocations in GaN. Since then, SCM [13][14][15], electrostatic force microscopy (EFM) [16][17][18][19][20], Kelvin probe force microscopy (KPFM) [18][19][20][21][22][23][24][25][26][27][28][29][30][31][32][33][34][35][36],conductive-tip atomic force microscopy (C-AFM) [35][36][37][38][39][40][41][42][43][44][45][46], piezoresponse force microscopy (PFM) [47][48][49][50] and scanning gate microscopy (SGM) [51] have all been employed to characterize III-nitride films and surfaces.…”
Section: Introductionmentioning
confidence: 99%