Electric fields in the sheath formed in a 300 mm, dual frequency capacitive argon discharge

Barnat, Edward V.; Miller, Paul A.; Hebner, G. A.; Paterson, Alex; Panagopoulos, Theodoros; Hammond, Edward; Holland, J.

doi:10.1088/0963-0252/16/2/016

Cited by 15 publications

(14 citation statements)

References 18 publications

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“…In contrast to Doppler LIF, LIF-dip is a two-laser diagnostic that measures the Stark splitting of Rydberg states to obtain the electric field experienced by an ion, rather than the complete IVDF. 23 Phase-resolved measurements of electric fields within collisional RF sheaths have been conducted by Barnat et al 32,33 Takizawa et al have used LIF-dip to measure electric fields within dc high voltage sheaths. 34,35 In this paper, we report time-resolved measurements of the IVDF within an RF sheath and presheath obtained by LIF at eight different phases of a 2.2 MHz RF bias waveform.…”

Section: Introductionmentioning

confidence: 99%

Temporally resolved ion velocity distribution measurements in a radio-frequency plasma sheath

et al. 2011

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The ion velocity distribution function (IVDF) above and within a radio-frequency (RF) biased plasma sheath is studied experimentally with a pulsed laser-induced fluorescence diagnostic in an industrial plasma etch tool. Temporally resolved measurements taken at eight different phases of the 2.2 MHz bias waveform show that the ion dynamics vary dramatically throughout the RF cycle (the ratio of the average ion transit time through the sheath to the RF period is s ion =s RF ¼ 0.3). The position of the presheath=sheath edge is constant throughout the RF cycle and the time-averaged ion flux is conserved within the sheath region. The characteristic bimodal structure of the time-averaged ion distributions found in previous experiments is observed to arise from the time-dependent ion dynamics, in accord with existing theory. The large temporal variation of the IVDF has implications for the plasma chemistry and etching quality. V

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Section: Introductionmentioning

confidence: 99%

Temporally resolved ion velocity distribution measurements in a radio-frequency plasma sheath

et al. 2011

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“…Here the technique is applied to krypton as a probe gas for the first time [5,6]. Similar methods for electric field measurements have already been developed and applied to other molecular and atomic probe gases like BCl [7], NaK [8], CS [9], He [10,11,12], H [13,14], argon [6,15,16,17,18,19] and Xe [20]. Knowledge of the field allows the determination of e.g.…”

Section: Introductionmentioning

confidence: 99%

Diagnostics of the plasma series resonance effect in radio-frequency discharges

Schulze¹,

Kampschulte²,

Luggenhölscher³

et al. 2007

J. Phys.: Conf. Ser.

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The intention of the paper is to give an example on how different plasma diagnostics can be combined in a synergistic way in order to investigate new physics. The link between the individual diagnostics has to be provided by theoretical concepts that predict certain relations between the different plasma parameters. The example chosen here is the effect of self-excited plasma series resonances in asymmetric capacitively coupled RF discharges. These resonance oscillations lead to high frequency current oscillations and are caused by a series resonance between the capacitive sheath and the effective inductance of the bulk which results from electron inertia. The non-linearity of the sheath is essential for the self-excitation of these oscillations. Laser spectroscopic electric field measurements, phase and space resolved optical emission spectroscopy, current, voltage, and Langmuir probe measurements are combined. The synergistic effect of these diagnostics in combination with a simple analytical model for the modification of the electron energy distribution function by electron beams yields information on cause and effect of electron heating and a better understanding of these fundamental phenomena.

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“…[1][2][3][4] Meanwhile, multifrequency CCP sources have also been developed with the goal of separately controlling ion and radical fluxes and ion energy distributions to the substrate. [5][6][7][8][9][10][11] Typically in a two-frequency CCP reactor, power is applied at a lower radio frequency ͑rf͒ ͓a few megahertz ͑MHz͒ to 10 MHz͔ to the lower electrode holding the wafer; and higher frequency power is applied to the upper electrode ͑tens of MHz to hundreds of MHz͒. Power at the lower frequency is intended to control the shape of the ion energy distributions to the wafer.…”

Section: Introductionmentioning

confidence: 99%

Modeling of magnetically enhanced capacitively coupled plasma sources: Two frequency discharges

Yang¹,

Kushner²

2007

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Magnetically enhanced, capacitively coupled radio frequency plasma sources are finding continued use for etching of materials for microelectronics fabrication at a time when multifrequency sources are also being developed. Magnetically enhanced reactive ion etching ͑MERIE͒ sources typically use magnetic fields of tens to hundreds of Gauss parallel to the substrate to either increase the plasma density at a given pressure or to lower the operating pressure. Multifrequency sources are used to separately control the magnitude of the ion and radical fluxes ͑typically with a high frequency source͒ and the ion energy distributions ͑typically with a low frequency͒ to the substrate. In this article, the properties of a two-frequency MERIE reactor are discussed using results from a computational investigation. As in single frequency sources, the reduction in transverse electron mobility as the magnetic field increases can produce a reversal of the electric field in the sheath and an increase in voltage drop across the bulk plasma. These trends decrease ion energies and increase the angular spread of ions. Similar trends are found here, including a field reversal in the sheath at the high frequency electrode. These effects produce a coupling between the high and low frequency sources that compromise the independence of ion production and ion acceleration by the two sources.

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Electric fields in the sheath formed in a 300 mm, dual frequency capacitive argon discharge

Cited by 15 publications

References 18 publications

Temporally resolved ion velocity distribution measurements in a radio-frequency plasma sheath

Temporally resolved ion velocity distribution measurements in a radio-frequency plasma sheath

Diagnostics of the plasma series resonance effect in radio-frequency discharges

Modeling of magnetically enhanced capacitively coupled plasma sources: Two frequency discharges

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