We show that using maskless photolithography and the lift-off technique patterned yttrium iron garnet thin films possessing ultra-low Gilbert damping can be accomplished. The films of the 70 nm thickness were grown on (001)-oriented gadolinium gallium garnet by means of pulsed laser deposition and exhibit high crystalline quality, low surface roughness and effective magnetization of 127 emu/cm 3 . The Gilbert damping parameter is as low as 5 × 10 −4 . The obtained structures have well-defined sharp edges which along with good structural and magnetic film properties, pave a path in the fabrication of high-quality magnonic circuits as well as oxide-based spintronic devices.Yttrium iron garnet (Y 3 Fe 5 O 12 , YIG) has become an intensively studied material in recent years due to exceptionally low damping of magnetization precession and electrical insulation enabling its application in research on spin-wave propagation 1-3 , spin-wave based logic devices 4-6 , spin pumping 7 , and thermally-driven spin caloritronics 8 . These applications inevitably entail film structurization in order to construct complex integrated devices. However, the fabrication of high-quality thin YIG films requires deposition temperatures over 500C 6,[9][10][11][12][13][14][15][16][17][18] leading to top-down lithographical approach that is ion-beam etching of a previously deposited plain film whereas patterned resist layer serves as a mask.Consequently, this method introduces crystallographic defects, imperfections to surface structure and, in the case of YIG films, causes significant increase of the damping parameter. [19][20][21] Moreover, it does not ensure well-defined structure edges for insulators, which play a crucial role in devices utilizing