1976
DOI: 10.1002/pssb.2220770231
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Electric field induced changes of the fundamental absorption and low‐temperature energy relaxation in n‐type GaSb

Abstract: The dependence of the absorption coefficient a on the photon energy is investigated for different degenerately doped samples of n-type GaSb in the region of the fundamental absorption. A comparison of the experimental data with the theory by Dyakonov e t al.shows satisfactory agreement for a > 500 crn-'. The application of pulsed electric fields a t a lattice temperature of 6 K gradually removes the Burstein-Moss shift.

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Cited by 8 publications
(3 citation statements)
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“…Any uncertainty about the p value only alters the fitted D value as these two quantities enter the energy loss expression in the form D p 1/2 . It may be noted that Obiditsch and Kahlert [19] obtained a fair agreement between their calculations and ELR data in bulk n-GaSb using a value of D = 5.2 × 10 3 eV. Calculations of energy loss by Kubakaddi and Krishnamurthy [22] in bulk n-InSb agree with the experimental data for a D = 1.24 × 10 3 eV.…”
Section: Resultssupporting
confidence: 59%
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“…Any uncertainty about the p value only alters the fitted D value as these two quantities enter the energy loss expression in the form D p 1/2 . It may be noted that Obiditsch and Kahlert [19] obtained a fair agreement between their calculations and ELR data in bulk n-GaSb using a value of D = 5.2 × 10 3 eV. Calculations of energy loss by Kubakaddi and Krishnamurthy [22] in bulk n-InSb agree with the experimental data for a D = 1.24 × 10 3 eV.…”
Section: Resultssupporting
confidence: 59%
“…Ganguly and Ngai [21] have formulated an effective Hamiltonian for the interaction between electrons and two-phonons. Employing this formalism the energy loss rates are satisfactorily explained in InSb [22], GaAs [23] by Kubakaddi and co-workers and in GaSb [19] by Obditsch and Kahlert. Free carrier absorption in InSb [21] and mobility in Si [11] are also explained employing electron scattering by two-phonons.…”
Section: Two-phonon Processes In Bulk Semiconductorsmentioning
confidence: 93%
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