Transport measurements (resistivity and Hall density) were made in the temperature range 10–300 K on n‐Pb1−x Eux Se (0 ≤ x ≤ 8%) epilayers grown by molecular beam epitaxy on silicon substrates. In the vicinity of 77 K anomalies of electron concentration were observed. To explain this anomalous behaviour, a model is proposed based on the existence of three levels: two donors and one acceptor. The origin of these levels is attributed to native defects. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)