Elastic–plastic resistance profile of PBII nitrided titanium

Fouquet, V.; Bourhis, E. Le; Pichon, L.; Drouet, M.; Straboni, A.

doi:10.1016/j.scriptamat.2004.06.029

Cited by 20 publications

(5 citation statements)

References 22 publications

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“…When it was developed in the 1980th [ 21 ], the main goal of PBII (often referred to as PIII, Plasma Immersion Ion Implantation) was to combine the benefits of both ion implantation (deep insertion of species) and the versatility of plasma treatments, e.g., by overcoming the line-of-sight restriction, for metallurgical applications [ 22 , 23 , 24 ]. Although interesting laboratory results have been obtained in different domains [ 25 , 26 , 27 , 28 ], the technique remains quite confidential as the inherent difficulties to upscale are not compensated by the benefits obtained compared to standard plasma treatments.…”

Section: Nitriding With Plasma Implantation and Gasmentioning

confidence: 99%

“…Instead, nanoindentation requires cross-sections to be prepared or the polishing of the treated surface with the risk of losing the most superficial material [ 47 ]. So far, the strong mechanical gradient at the subsurface makes such preparations difficult [ 25 ]. Nonetheless, both cross-sectional and surface nanoindentation testing have been realized on nitrided specimens.…”

Section: Surface Mechanical Benefitsmentioning

confidence: 99%

“…Moreover, complex-shaped metal components are much cheaper than their equivalent ceramic ones. In this applicative domain, titanium alloys are by far the most interesting choice and can give rise to a tremendous amount of research (see, for example, [ 3 , 8 , 25 , 26 , 39 , 42 , 43 , 50 , 62 ]).…”

Section: Conclusion and Prospectsmentioning

confidence: 99%

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Low Temperature Nitriding of Metal Alloys for Surface Mechanical Performance

Drouet

Bourhis

2023

Materials

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Metallic alloys are, by essence, ductile and stiff and can support loads without sudden rupture. This ductility becomes a disadvantage when applications require wear resistance. In this case, the hardening of the surface is required while retaining a core performance. Here, nitriding at low temperatures has proven to be beneficial and has potential. In fact, any phase transitions or unwanted compound precipitations that occur at higher temperatures have to be avoided as they would have a deleterious effect on the chemical homogeneity and mechanical properties. The present contribution summarizes the achievements made with such treatments on metallic alloys. We considered the most popular treatments, namely plasma, implantation, and gas nitridings.

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Section: Nitriding With Plasma Implantation and Gasmentioning

confidence: 99%

Section: Surface Mechanical Benefitsmentioning

confidence: 99%

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Low Temperature Nitriding of Metal Alloys for Surface Mechanical Performance

Drouet

Bourhis

2023

Materials

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“…These techniques enable lower temperatures but at the cost of a relatively thinner diffusion layer, as a consequence of slower diffusion. Therefore, this results in the formation of a surface zone constituted of very hard layers of TiN and Ti 2 N compounds, and a supporting diffusion zone of variable thickness [8,9]. These nitride layers have high hardness and low friction coefficient.…”

Section: -Contextmentioning

confidence: 99%

Surface engineering of titanium by multi-interstitial diffusion using plasma processing

et al. 2020

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Titanium and its alloys possess a range of highly interesting properties such as excellent corrosion resistance, high specific strength and biocompatibility, but suffers from poor wear resistance. The present work addresses plasma assisted surface treatment of CP 2 titanium using various combinations of oxygen and nitrogen, i.e. mixed interstitials. The sequence of controlled plasma nitriding and oxidizing treatments plays a significant role for the evolution of the hardness depth profiles and the development of the surface compound layer and the underlying diffusion/transition zone. Composition profiles of oxygen and nitrogen are obtained by GDOES; Mixed interstitial solubility of nitrogen and oxygen is found in both h.c.p. α titanium and in the compound layer. The combination of interstitials leads to larger case depth, in particular for the diffusion zone (expanded h.c.p. α titanium). Therefore, it highlights the advantages of combined nitriding and oxidizing compared to single nitriding treatments on the mechanical properties.

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“…Especially, many studies on nitrogen (N) implantation by PBII technique have been carried out for surface nitridation of metals, such as aluminum [3], steel [4] and titanium alloys [5], and for modification of surface properties of polymer, such as polyethylene [6]. However, it is not always clarified on the effects of N implantation on surface modification by PBII system.…”

Section: Introductionmentioning

confidence: 99%

Surface Modification of Silicon Substrates due to Nitrogen Implantation by Plasma Based Ion Implantation

Nakao

2010

Trans. Mat. Res. Soc. Japan

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A plasma based ion implantation (PBII) to Si wafers with N ions is performed and the surface modification of Si, i.e., the compositional and structural changes at the surface, are examined by energy dispersive X-ray spectrometer (EDX), Raman and Fourier Transform Infrared (FT-IR) spectroscopy, Rutherford backscattering spectrometry (RBS), X-ray diffraction (XRD) measurements and X-ray photoelectron spectroscopy (XPS). To check ion species in N 2 plasma, optical emission spectroscopy is also carried out. The implantation time is varied from 10 min to 7 h. It is found that the N concentration is increased with increasing implantation time up to 1 h, and then tends to be saturated at further implantation time. The results of Raman measurements indicate that the small peaks from a-Si and/or a-SiN x appear after N ion implantation in addition to the Raman peak from Si crystal. It is also confirmed by FT-IR and XRD measurements that a broad peak assigned to Si-N bonds appears and no crystal phases of Si 3 N 4 is observed after N ion implantation. That the maximum N areal density is approximately 1.7 x 10 17 atoms/cm 2 is obtained for the sample implanted for 7 h. The XPS results show that implanted N mostly bonds to Si, and the ratio of N/Si at the surface is slightly increased over 1 h until 7 h. Judging from these results, it is suggested that a-SiN x is formed on Si wafer by N ion implantation using PBII system.

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Elastic–plastic resistance profile of PBII nitrided titanium

Cited by 20 publications

References 22 publications

Low Temperature Nitriding of Metal Alloys for Surface Mechanical Performance

Low Temperature Nitriding of Metal Alloys for Surface Mechanical Performance

Surface engineering of titanium by multi-interstitial diffusion using plasma processing

Surface Modification of Silicon Substrates due to Nitrogen Implantation by Plasma Based Ion Implantation

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