1997
DOI: 10.1016/s0040-6090(97)00089-8
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Elaboration of Bi2Te3 by metal organic chemical vapor deposition

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Cited by 58 publications
(30 citation statements)
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“…The film density is therefore expected to change in accordance with the change of lattice constant [15,16]. The matching of d values indicates that the structure is hexagonal polycrystalline nature of the substance [17][18][19]. The grain size of the films was calculated from the XRD using Scherer's relation [20],…”
Section: Article In Pressmentioning
confidence: 99%
See 1 more Smart Citation
“…The film density is therefore expected to change in accordance with the change of lattice constant [15,16]. The matching of d values indicates that the structure is hexagonal polycrystalline nature of the substance [17][18][19]. The grain size of the films was calculated from the XRD using Scherer's relation [20],…”
Section: Article In Pressmentioning
confidence: 99%
“…They, in the form of thin films, have already been elaborated by flash evaporation [4], hot wall epitaxy [5], sputtering [3], metal oxide chemical vapor deposition [6] and molecular beam epitaxy [7]. Kaddouri et al [8] have studied optical properties of bismuth telluride thin films grown by hotwall epitaxy on Si (1 0 0) and SiO 2 substrates.…”
Section: Introductionmentioning
confidence: 99%
“…5 structure. Morphology and crystal orientation of the films were dependent on the deposition potentials.…”
Section: Article In Pressmentioning
confidence: 99%
“…They are traditionally synthesized by powder metallurgy [3] and zone melting processes [4] in bulk forms. Requirements of miniaturization for TE devices stimulate the research on fabricating Bi 2 Te 3 -based thin films by sputtering and evaporation methods [5][6]. However, those techniques are expensive and not readily to produce large-area TE materials.…”
Section: Introductionmentioning
confidence: 99%
“…Bismuth telluride and its derivatives are the most important semiconductor thermoelectric materials used in the fabrication of devices for the 200 K to 400 K temperature range, 1 in particular Bi 2 Te 2.7 -Se 0.3 and Bi 0.5 Sb 1.5 Te 3 as n-and p-type materials, respectively. A large number of techniques can be used to synthesize these compounds: single-crystal growth, 2 sintering, 3 vacuum arc-plasma evaporation, 4 metal organic chemical vapor deposition (MOCVD), 5,6 etc. Electrochemical deposition (ECD) also opens up opportunities for thin-film microsystems, since this method is considerably simpler and cheaper than other techniques.…”
Section: Introductionmentioning
confidence: 99%