2008
DOI: 10.1016/j.micron.2008.05.010
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Elaboration and characterization of barium silicate thin films

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Cited by 11 publications
(6 citation statements)
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“…The stronger peak is probably from BaCO 3 , which agrees with the Ba 3d 5=2 peak at 779.4 eV and the C 1s peak at 288.5-288.7 eV. 26,27) The weaker one is possibly from a barium silicate, since similar chemical shifts are reported for annealed Ba=SiO 2 structures. 27) Si 2p 3=2 peaks at 99.9-100.1 eV are also consistent with a barium silicate, Ba 2 SiO 4 .…”
Section: Resultssupporting
confidence: 79%
“…The stronger peak is probably from BaCO 3 , which agrees with the Ba 3d 5=2 peak at 779.4 eV and the C 1s peak at 288.5-288.7 eV. 26,27) The weaker one is possibly from a barium silicate, since similar chemical shifts are reported for annealed Ba=SiO 2 structures. 27) Si 2p 3=2 peaks at 99.9-100.1 eV are also consistent with a barium silicate, Ba 2 SiO 4 .…”
Section: Resultssupporting
confidence: 79%
“…Two contributions can be observed in O 1s line: one at 528 eV corresponding to barium oxide and one at 530 eV which could correspond to barium silicate. 8 In parallel, in the Si 2p line two contributions can be evidenced: in addition to the Si 0 one, a feature at 102.0 eV can be revealed for growth at 700 • C. Such a peak cannot be attributed to SiO 2 and its binding energy is consistent with the one of silicate component. 8 Thus, these deposition conditions allow both oxide and silicate growths, the temperature influencing their respective amount.…”
Section: Cvd Growth and In Situ Characterizationmentioning
confidence: 79%
“…8 In parallel, in the Si 2p line two contributions can be evidenced: in addition to the Si 0 one, a feature at 102.0 eV can be revealed for growth at 700 • C. Such a peak cannot be attributed to SiO 2 and its binding energy is consistent with the one of silicate component. 8 Thus, these deposition conditions allow both oxide and silicate growths, the temperature influencing their respective amount. Limited thickness of the deposited layer is confirmed by the presence of Si 0 metallic contribution in Si 2p region.…”
Section: Cvd Growth and In Situ Characterizationmentioning
confidence: 79%
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