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Dennler, Gilles; Houdayer, A.; Raynaud, Patrice; Séguy, Isabelle; Ségui, Y.; Wertheimer, M. R.

doi:10.1023/a:1022865825205

Cited by 49 publications

(47 citation statements)

References 11 publications

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“…[9] Thus, pure chemical etching by oxygen species can only compete with deposition processes in the virtual absence of energetic particles and very low deposition rates. [69] For a different reactor configuration where ion bombardment on the film surface is much lower (asymmetric setup with the substrate placed on the grounded electrode), we could not obtain a steady decrease in the deposited mass as a function of the energy input for a CO 2 / C 2 H 4 ratio of 6:1. [6] This supports the assumption that the decrease in the growth rate with increasing energy input observed in Figure 4 and 5 for the 6:1 gas ratio is mainly caused by ion-enhanced etching effects.…”

Section: A-c:h:omentioning

confidence: 78%

Growth Mechanism of Oxygen-Containing Functional Plasma Polymers

Hegemann

Körner

Albrecht

et al. 2010

Plasma Processes Polym.

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Section: A-c:h:omentioning

confidence: 78%

Growth Mechanism of Oxygen-Containing Functional Plasma Polymers

Hegemann

Körner

Albrecht

et al. 2010

Plasma Processes Polym.

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“…SiO 2 coatings are routinely obtained by low-temperature PECVD processes from a number of different organosilicon precursors, and the deposition conditions used determine the structure of the SiO 2 layer deposited. [19][20][21] Infrared absorption spectroscopy of films deposited from hexamethyl disiloxane (HMDSO) and oxygen (gas ratio HMDSO/O 2 was 1:10) provides information on the structural and compositional properties of the SiO 2 -like films, Figure 1a. The three transverse optical (TO) modes at 460, 800, and 1075 cm -1 are well documented in transmission measurements and are identified as the rocking, bending, and asymmetric stretching modes of the Si-OSi bond.…”

Section: Adhesion Aspectsmentioning

confidence: 99%

Recent and Expected Roles of Plasma‐Polymerized Films for Biomedical Applications

Förch¹,

Chifen²,

Bousquet³

et al. 2007

Chemical Vapor Deposition

141

125

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This review aims to provide a summary of some of the challenges in correlating surface science and biology, with particular emphasis on areas where plasma polymerization has and will play an important role as a method to synthesize reproducible and well-defined surfaces. Since the range of possible applications of plasma polymer films in biomaterial applications is immense, this paper will focus on processes to develop various surface morphologies and chemical structures for the immobilization of proteins and cells. Functional, plasma-polymerized films are discussed as biosensitive interfaces that may ultimately be part of a multilayer system that aims at connecting inorganic/metallic transducers with biologically reactive surfaces. These topics will be reviewed with some experimental results taken from the authors' own work. Specific aspects such as adhesion improvement and solvent effects are also discussed.

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“…1b) upon the same treatment. Thus the deposition of a 4 nm thick cover layer made by plasma polymerization of HMDSO [17,18] lead to a significant protection of a wear sensitive polymeric media.…”

Section: Introductionmentioning

confidence: 99%

“…The surfaces of plasma deposited (multi-) layers have previously been studied intensively [19,20]. Hard, SiO x like layers can be fabricated [17,18] for applications such as antireflective coatings [21], barrier layers [22], corrosion protection films [23] and biocompatible films [24]. The chemical composition of films made from HMDSO can be tuned either by the HMDSO/O 2 gas ratio and/or the RF-input power of the plasma deposition process [18,[25][26][27][28].…”

Section: Introductionmentioning

confidence: 99%