An extensive parameter analysis is performed on the Electron-Hole Bilayer Tunnel FET (EHBTFET) using a 1D effective mass (EMA-NP) Schrödinger/Poisson solver with non-parabolic corrections considering thin InAs, In0.53Ga0.47As, Ge, Si0.5Ge0.5 and Si films. It is found that depending on the channel material and channel thickness, the EHBTFET can operate either as a 2D-2D or 3D-3D tunneling device. InAs offers the highest ION, whereas for Si and Si0.5Ge0.5 EHBTFET significant current levels cannot be achieved within a reasonable voltage range. The general trends are explained through an analytical model which shows a close agreement with numerical results.