“…Concerning the methods employed thus far to deposit thin films of LiNbO 3 , the most commonly utilized techniques include liquid phase epitaxy (LPE) [ 39 ], chemical beam vapor deposition [ 40 ], metalorganic chemical vapor deposition (MOCVD) [ 16 , 41 , 42 , 43 , 44 ], pulsed layer deposition (PLD) [ 45 , 46 ], molecular beam epitaxy (MBE) [ 47 , 48 ], RF sputtering [ 49 , 50 , 51 ], atomic layer deposition (ALD) [ 52 , 53 ], and sol–gel deposition [ 54 , 55 ]. In the early 1990s, Nashimoto et al reported the sol–gel deposition of epitaxial LN films from lithium ethoxide and niobium pentaethoxide with varying water contents on sapphire substrates [ 56 ].…”