2017
DOI: 10.1038/nphoton.2017.122
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Efficient low-loss InGaAsP/Si hybrid MOS optical modulator

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Cited by 179 publications
(85 citation statements)
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“…Single or double SLG electro-absorption modulators can also be used as electro-refractive modulators, for example, in a MZI modulator with SLG phase shifters on its two arms [70,77]. The FOM PM for SLG-based electrorefractive modulators is about ten times higher than that for Si-based phase modulators when μ of SLG is high (τ > 100 fs), comparable to that of InGaAsP (refs [105,106]). This higher FOM PM is a result of the combination of the large electro-refractive effect, V π L, and low α loss .…”
Section: Graphene-based Modulatorsmentioning
confidence: 99%
See 1 more Smart Citation
“…Single or double SLG electro-absorption modulators can also be used as electro-refractive modulators, for example, in a MZI modulator with SLG phase shifters on its two arms [70,77]. The FOM PM for SLG-based electrorefractive modulators is about ten times higher than that for Si-based phase modulators when μ of SLG is high (τ > 100 fs), comparable to that of InGaAsP (refs [105,106]). This higher FOM PM is a result of the combination of the large electro-refractive effect, V π L, and low α loss .…”
Section: Graphene-based Modulatorsmentioning
confidence: 99%
“…With this configuration, a 3 dB modulation bandwidth of 2 GHz and a data rate of 32 Gb s −1 with V π L = 0.9 V mm were reported [105]. The InGaAsP-thin-oxide-Si stack exploits the capacitor concept first used in the Si-insulator-Si capacitor (SISCAP) [93], with the advantage of replacing the lossy poly-Si top layer with a highly efficient electro-refractive n-doped InGaAsP membrane [105,106]. The SLG-thinoxide-SLG capacitor exploits the same effect, with good electro-refractive efficiency, but with the advantage that the capacitor is placed on a passive waveguide made of, for example, either Si, SiN or SiO 2 (refs [70,77]).…”
Section: Graphene-based Modulatorsmentioning
confidence: 99%
“…Similar to previously demonstrated pure Si MOS modulators, this heterogeneous MOS capacitor is extremely useful to introduce the plasma dispersion effect [38] into the heterogeneous photonic device platform. EOMs using InGaAsP/Si hybrid MOS capacitors have been demonstrated [104,105]. The optical mode has a large overlap with carriers in the n-InGaAsP/Al 2 O 3 /p-Si MOS capacitor that achieves a voltagelength product as low as 0.047 V•cm which has almost 5× smaller than a typical hybrid III-V silicon modulator.…”
Section: Hybrid Electro-optic Modulatorsmentioning
confidence: 99%
“…As listed in Table 5, modulators can be operated at much higher data rates than their bandwidths by implementing pre-emphasis equalization such as a finite impulse response (FIR) filter [70,105]. Additionally, advanced modulation techniques such as PAM4 [76,104] and duo-binary [100] are another alternative to increase the data rate. As listed in Table 5, modulators with higher modulation efficiency, e.g., high-Q modulators and hybrid III-V on silicon modulators, usually own higher energy efficiency due to the smaller footprint or lower driving voltage.…”
Section: Hybrid Electro-optic Modulatorsmentioning
confidence: 99%
“…State-of-the-art silicon on-off keying (OOK) modulators are currently reaching 50-Gb/s operation, [4][5], while higher modulation format such as n-level pulse amplitude modulation (PAM-n), quadrature phase-shift keying (QPSK), or 16-state quadrature amplitude modulation (16-QAM) allow to increase transmission rate up to 224 Gb/s [6][7][8][9][10][11][12]. As a major step forward, the phase efficiency of the modulators has recently been significantly increased [13][14]. While most of the reported work has been done in the C-band of telecommunication (around 1550 nm), silicon photonics systems are highly attractive for short-distance intra-data-center communications [15], where the O-band (around 1300 nm) is widely used.…”
mentioning
confidence: 99%