Efficiency enhancement of quantum-dot light-emitting diodes via rapid post-treatment of intense pulsed light sintering technique

Tang, Pengyu; Wei, Changting; Xie, Liming; Chen, Xiaolian; Li, Xia; Bai, Song; Su, Wenming; Wang, Fengxia; Cui, Zheng

doi:10.1016/j.cplett.2019.137048

Cited by 2 publications

(1 citation statement)

References 28 publications

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“…QLEDs aged sufficiently by IPL retain their luminance and efficiency characteristics. ZnMgO nanoparticles as ETL for QLED were also reported as shown in figure 13(g) [117]. The IPL sintering onto ITO glass (bottom) and Al (top) for sintering of ZnMgO and local annealing of the Al/ZnMgO interface was performed using the transparent substrate characteristics (figure 13(h)).…”

Section: Sintering Of Metal Oxide Nanostructuresmentioning

confidence: 99%

A review on intense pulsed light process as post-treatment for metal oxide thin films and nanostructures for device application

Noh¹,

Kim²,

Lee³

et al. 2022

Nanotechnology

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The intense pulsed light (IPL) post-treatment process has attracted great attention in the device fabrication due to its versatility and rapidity particularly for solution process functional structures in devices, flexible/printed electronics, and continuous manufacturing process. The metal oxide materials inherently have multi-functionality and have been widely used in form of thin films or nanostructures in device application such as thin-film transistors, light-emitting diodes, solar cells, supercapacitors, etc. The IPL treatment enhances the physical and/or chemical properties of the functional metal oxide through photothermal effects. However, most metal oxides are transparent to most range of visible light and require more energy for post-treatment. In this review, we have summarized the IPL post-treatment processes for metal oxide thin films and nanostructures in device applications. The sintering and annealing of metal oxides using IPL improved the device performances by employing additional light absorbing layer or back-reflector. The IPL process becomes an innovative versatile post-treatment process in conjunction with multi-functional metal oxides in near-future device applications.

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Section: Sintering Of Metal Oxide Nanostructuresmentioning

confidence: 99%

A review on intense pulsed light process as post-treatment for metal oxide thin films and nanostructures for device application

Noh¹,

Kim²,

Lee³

et al. 2022

Nanotechnology

View full text Add to dashboard Cite

show abstract

Post-treatment for Printed Electronics

2022

Printed Electronics Technologies

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The presence of insulating organic components between the functional electronic components in printing inks makes a drastic reduction in the number of percolation paths in the printed patterns. Nevertheless, this also results in the printed tracks having very high resistivity that cannot be put into practical application. In this chapter, the main sintering process methods, including conventional thermal sintering, photonic sintering, laser sintering, plasma sintering, microwave sintering and electrical sintering techniques, are demonstrated.

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Efficiency enhancement of quantum-dot light-emitting diodes via rapid post-treatment of intense pulsed light sintering technique

Cited by 2 publications

References 28 publications

A review on intense pulsed light process as post-treatment for metal oxide thin films and nanostructures for device application

A review on intense pulsed light process as post-treatment for metal oxide thin films and nanostructures for device application

Post-treatment for Printed Electronics

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