Effects of rf power on the structural properties of carbon nitride thin films prepared by plasma enhanced chemical vapour deposition

Othman, Maisara; Ritikos, Richard; Khanis, Noor Hamizah; Rashid, Nur Maisarah Abdul; Rahman, Saadah Abdul; Gani, Siti Meriam Ab.; Muhamad, Muhamad Rasat

doi:10.1016/j.tsf.2011.01.065

Cited by 21 publications

(15 citation statements)

References 30 publications

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“…A set of a-CN x thin films was prepared at applied rf power of 50, 60, 70, 80, 90 and 100 W. Prior to the actual deposition process, the quartz substrates were exposed to hydrogen plasma treatment for 10 min at H 2 flow rate and rf power fixed at 50 sccm and 50 W, respectively. This was done to remove impurities on the substrate surface and improve the adhesion of CN layers onto the substrate [11]. The a-CN x thin films samples were deposited for 90 min and substrate temperature at 100 o C. Samples were anneal in a quartz tube furnace in pure Ar at 400 o C for 1 hour.…”

Section: Methodsmentioning

confidence: 99%

“…When the rf power exceeds 80W, CH 4 , the power is high enough to completely dissociate the main precursor gas resulting in the saturation of available radicals and consequently the deposition rate [11]. Normally the radicals formed would react with unreacted molecules in secondary reactions in the plasma.…”

Section: Methodsmentioning

confidence: 99%

“…These includes electron cyclotron resonance microwave plasma chemical vapor deposition [7], rf magnetron sputtering, [8], graphite hollow cathode system [9], hollow cathode discharge [10], and radio frequency plasma enhanced chemical vapor deposition (rf-PECVD) [11]. Among these rf PECVD is favoured since this technique has the advantage of uniform large area deposition, easy handling, low pinhole density, good adhesion and good step coverage [11]. In this work, a set of a-CN x films have been deposited using rf-PECVD technique at variation of rf power.…”

Section: Introductionmentioning

confidence: 99%

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Effect of RF power and annealing on chemical bonding and morphology of a-CNx thin films as humidity sensor

Aziz¹,

Ritikos²,

Kamal³

et al. 2013

AIP Conference Proceedings

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Structural and electronic properties of electron cyclotron resonance plasma deposited hydrogenated amorphous carbon and carbon nitride films Journal of Applied Physics 91, 4154 (2002) Abstract. Amorphous carbon nitride (a-CN x ) thin films were deposited using radio frequency plasma enhanced chemical vapor deposition (rf-PECVD) technique. A set of a-CN x thin films were prepared using pure methane (CH 4 ) gas diluted with nitrogen (N 2 ) gas. The rf power was varied at 50, 60, 70, 80, 90 and 100 W. These films were then annealed at 400 o C in a quartz tube furnace in argon (Ar) gas. The effects of rf power and thermal annealing on the chemical bonding and morphology of these samples were studied. Surface profilometer was used to measure film thickness. Fourier transform infra-red spectroscopy (FTIR) and Field emission scanning electron microscopy (FESEM) measurements were used to determine their chemical bonding and morphology respectively. The deposition rate of the films increased constantly with increasing rf power up to 80W, before decreasing with further increase in rf power. Fourier transform infra-red spectroscopy (FTIR) studies showed a systematic change in the spectra and revealed three main peaks included C-N, C=N, C=C and C≡N triple bond. C=N and C≡N bonds decreased with increased C-N bonds after thermal annealing process. The FESEM images showed that the structure is porous for as-deposited and covered by granule-like grain structure after thermal annealing process was done. The resistance of the a-CN x thin film changed from 23.765 kΩ to 5.845 kΩ in the relative humidity range of 5 to 92 % and the film shows a good response and repeatability as a humidity sensing materials. This work showed that rf power and thermal annealing has significant effects on the chemical bonding and surface morphology of the a-CN x films and but yield films which are potential candidate as humidity sensor device.

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Section: Methodsmentioning

confidence: 99%

Section: Methodsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Effect of RF power and annealing on chemical bonding and morphology of a-CNx thin films as humidity sensor

Aziz¹,

Ritikos²,

Kamal³

et al. 2013

AIP Conference Proceedings

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“…Dalam kajian ini, gas C 2 H 2 digunakan. Dalam kajian yang lepas oleh (Othman et al 2011), gas metana (CH 4 ) digunakan semasa pemendapan filem. Saiz kluster filem yang dimendapkan menggunakan gas metana berkurang apabila kuasa RF bertambah dan lebih kecil berbanding filem yang dimendapkan menggunakan gas C 2 H 2 .…”

Section: Kaedah Uji Kajiunclassified

“…Pelbagai teknik boleh digunakan untuk menghasilkan filem nipis a-CN x seperti percikan magnetron (Nakayama et al 1993), pemendapan wap kimia (CVD) (Zhang et al 1996), pemendapan pancaran ion (Hammer et al 1996) dan pemendapan wap kimia secara peningkatan plasma (PECVD) . Antara teknik tersebut, PECVD digunakan kerana mempunyai beberapa kelebihan iaitu pemendapan yang luas dan homogen, lekatan yang baik serta ketumpatan liang jejarum yang rendah (Othman et al 2011). Pemendapan menggunakan teknik PECVD juga dapat dijalankan pada suhu rendah.…”

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Kesan Kuasa Frekuensi Radio terhadap Komposisi Ikatan Kimia Filem Nipis a-CNx sebagai Pengesan Kelembapan

Aziz

Awang²

2017

JSM

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Solvent‐Assisted Synthesis of Supramolecular‐Assembled Graphitic Carbon Nitride for Visible Light Induced Hydrogen Evolution – A Review

et al. 2021

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Many graphitic carbon nitride (g‐C3N4)‐based photocatalysts have attracted a significant interest because of the unique arrangement of carbon and nitrogen atoms. Changeable morphologies with tunable bandgap of g‐C3N4 materials were used in many applications including batteries, photovoltaics, photocatalysts, sensors, etc. This review focuses on the recent progress in the solvent assisted supramolecular‐assembled carbon nitride preparation for visible light induced hydrogen evolution from water. The synthesis involves tailoring the supramolecular assembly from different monomers followed by calcination. Different types of non‐covalent interactions between the monomers have been explained. In addition, the crucial role of solvent has been re‐counted in terms of the alteration of the structural morphology of assemblies. The mechanistic pathways of interaction in the formation of supramolecular assemblies have been also documented by molecular dynamics simulation. Finally, visible light triggered hydrogen evolution has been demonstrated along with discussion on challenges and future research direction.

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Effects of rf power on the structural properties of carbon nitride thin films prepared by plasma enhanced chemical vapour deposition

Cited by 21 publications

References 30 publications

Effect of RF power and annealing on chemical bonding and morphology of a-CNx thin films as humidity sensor

Effect of RF power and annealing on chemical bonding and morphology of a-CNx thin films as humidity sensor

Kesan Kuasa Frekuensi Radio terhadap Komposisi Ikatan Kimia Filem Nipis a-CNx sebagai Pengesan Kelembapan

Solvent‐Assisted Synthesis of Supramolecular‐Assembled Graphitic Carbon Nitride for Visible Light Induced Hydrogen Evolution – A Review

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