2016
DOI: 10.1109/led.2016.2584138
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Effects of Repetitive Mechanical Bending Strain on Various Dimensions of Foldable Low Temperature Polysilicon TFTs Fabricated on Polyimide

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Cited by 44 publications
(17 citation statements)
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“…The increased response time after 5000 bending is attributed to the threshold voltage shift due to increased electron traps in SiO 2 . [ 35 ] Although the response time was increased after 5000 bending cycles, the sensor was still able to detect H 2 with different concentrations. The sensor responses under static bending were also presented in Figure S6, Supporting Information.…”
Section: Resultsmentioning
confidence: 99%
“…The increased response time after 5000 bending is attributed to the threshold voltage shift due to increased electron traps in SiO 2 . [ 35 ] Although the response time was increased after 5000 bending cycles, the sensor was still able to detect H 2 with different concentrations. The sensor responses under static bending were also presented in Figure S6, Supporting Information.…”
Section: Resultsmentioning
confidence: 99%
“…Chen et al reported that positive gate sweep after mechanical stress on poly‐Si TFT causes the electron trapping at GBs. [ 29,30 ] Therefore, the V TH shifts to positive after out‐folding stress. If the atomic bonds in poly‐Si and SiO 2 are broken or weakened, O, H, and hydroxyl (OH) could be formed inside the GI and GI/poly‐Si interface.…”
Section: Resultsmentioning
confidence: 99%
“…The electrical stability of the LTPS TFT can be affected by the mechanical strain. [ 26–34 ] Contrastingly, electro‐thermal (positive bias temperature stress (PBTS) or negative bias temperature stress (NBTS) after mechanical strain [ 35 ] can also severely deteriorate the electrical characteristics, which needs to be further studied.…”
Section: Introductionmentioning
confidence: 99%
“…[1~3] Also, the subthreshold slope (SS) increases through the generation of interface states and/or the barrier height lowering between source and channel by electron injection into GI, which is proposed to be severe at the poly-Si/SiO2 edge. [1,2,4,5] Field effect mobility also change. The mechanical stress induces an generation of grain boundary trap states, resulting in the decrease of mobilty.…”
Section: Introductionmentioning
confidence: 99%