Effects of Radio Frequency Bias on the Structure Parameters and Mechanical Properties of Magnetron-Sputtered Nb Films

Abstract

Due to its highly unreactive nature and advanced biocompatibility, niobium (Nb) coating films are increasingly being used to improve the corrosion resistance and biocompatibility of base implant materials. However, Nb films have relatively low yield strengths and surface hardness; therefore, it is necessary to explore a simple and low-cost method to improve their mechanical properties. Magnetron sputtering is a commonly used tool for Nb film deposition. Applying substrate bias can introduce Ar+ bombard to the film surface, which is effective to improve the film’s mechanical properties. As the direct current (DC) bias-sputtering tool requires an extra DC power supply, applying the negative bias by a radio frequency (RF) power source (usually installed in the sputtering system to conduct substrate pre-cleaning) will be more economical and convenient. Moreover, the RF bias was accompanied with higher ion density and energy compared to the DC bias. In this study, Nb films were deposited on silicon wafers by magnetron sputtering under different RF bias powers. The effects of the RF bias on the structural parameters and mechanical properties of the films were studied via stress measurements, X-ray diffraction, and indentation tests. The results show that the RF bias can change the crystal distribution, grain size, and lattice parameter of the film, as well as the mechanical properties. The stress of the Nb film was compressive; it increased markedly when an RF power was applied and saturated when the RF power was over 40 W. The hardness of the film increased from 4.17 GPa to 5.34 GPa with an elevating RF power from 0 W to 60 W. This study aimed to enhance the mechanical properties of the Nb films deposited by RF-biased sputtering, which provides wider potentials for Nb film as protective coatings for medical–biological implant bodies. Although the research was carried out on Si substrates to facilitate the study of film stress, we believe that the evolution trends of our results will also apply to other metal substrates, because the measured film mechanical properties are intrinsic.