Effects of r.f. bias and nitrogen flow rates on the reactive sputtering of TiA1N films

Shew, Bor‐Yuan; Huang, Jow–Lay; Lii, Ding-Fwu

doi:10.1016/s0040-6090(96)09038-4

Cited by 52 publications

(17 citation statements)

References 34 publications

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“…When N 2 ratio increases to 100%, excessive nitrogen hinders the preferred growth of the coatings and induces the phase separation. This is because the nitrification of Al atoms initiates at higher nitrogen partial pressure [12].…”

Section: Methodsmentioning

confidence: 99%

Characterization and temperature controlling property of TiAlN coatings deposited by reactive magnetron co-sputtering

Chen

Wang

Zhang

et al. 2009

Journal of Alloys and Compounds

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Section: Methodsmentioning

confidence: 99%

Characterization and temperature controlling property of TiAlN coatings deposited by reactive magnetron co-sputtering

Chen

Wang

Zhang

et al. 2009

Journal of Alloys and Compounds

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“…The increase of the coating hardness with the increase of a negative substrate bias is usually followed by a decrease of adhesion strength due to the increase of residual stress. The optimum wear resistance of the TiAlN coating occurs at a higher substrate bias and nitrogen flow rate; however, after increasing the nitrogen flow rate further, the degraded wear resistance occurred [6]. The present study results show that the flank wear of the TiAlN-coated insert decreases with an increasing nitrogen flow rate.…”

Section: Resultsmentioning

confidence: 49%

“…Similar results were reported by other researchers. The hardness of the TiAlN coating increased with an increasing substrate bias due to the increase in the coating density [6,9]. The increase of the coating density is attributed to reducing the coating crystal size and the finer microstructure.…”

Section: Resultsmentioning

confidence: 99%

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The Mechanical and Tribology Properties of Sputtered Titanium Aluminum Nitride Coating on the Tungsten Carbide Insert Tool in the Dry Turning of Tool Steel

Budi¹,

Muhamad²,

Rahman³

2015

MST

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The effect of the sputtering parameters on the mechanical tribology properties of Titanium Aluminum Nitride coating on the tungsten cabide insert tool in the dry turning of tool steel has been investigated. The coating was deposited using a Direct Current magnetron sputtering system with various substrate biases (-79 to -221 V) and nitrogen flow rates (30 to 72 sccm). The dry turning test was carried out on a Computer Numeric Code machine using an optimum cutting parameter setting. The results show that the lowest flank wear (~0.4 mm) was achieved using a Titanium Aluminum Nitride-coated tool that was deposited at a high substrate bias (-200 V) and a high nitrogen flow rate (70 sccm). The lowest flank wear was attributed to high coating hardness. AbstrakSifat Mekanik dan Tribologi Lapisan Titanium Aluminium Nitrida pada Perkakas Tungsten Karbida dalam Pemotongan Kering Baja. Telah dilakukan penelitian mengenai pengaruh parameter sputering terhadap sifat mekanik dan tribologi lapisan Titanium Aluminum Nitrida pada perkakas potong tungsten karbida dalam proses pemotongan turning kering baja perkakas. Deposisi lapisan tipis dilakukan menggunakan sistem sputtering magnetron dengan variasi tegangan substrate (-79 s/d -221 Volt) dan laju alir gas nitrogen (30 s/d 72 sccm). Pemotongan turning kering dilakukan menggunakan mesin bubut otomatis CNC dengan parameter pemotongan optimum. Hasil percobaan menunjukan bahwa aus sisi terendah (~0.4 mm) perkakas ditunjukan oleh lapisan Titanium Aluminum Nitrida yang dideposisikan pada tegangan substrat (-200 V) dan laju alir gas nitrogen (70 sccm) tinggi. Rendahnya aus sisi perkakas diakibatkan oleh tingginya nilai kekerasan lapisan.

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“…According to the literature, the compact plane (111) originates sliding when stress is present, producing a low (cutting) strain. Another crystallographic referent is the plane (200) that theoretically contains the lowest energy in the case of materials with NaCl type structure [31]. As the bombardment energy increases, the Al atoms in the crystallographic lattice increase and also the plane (111) peak's intensity decreases rapidly.…”

mentioning

confidence: 99%

Structural and Morphological Properties of Titanium Aluminum Nitride Coatings Produced by Triode Magnetron Sputtering

Devia

Vélez-Restrepo

2014

ing.cienc.

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TixAl1−xN coatings were grown using the triode magnetron sputtering technique varying the bias voltage between -40 V and -150V. The influence of bias voltage on structural and morphological properties was analyzed by means of energy dispersive spectroscopy, x-ray diffraction and atomic force microscopy techniques. As the bias voltage increased, an increase in the Al atomic percentage was observed competing with Ti and producing structural changes. At low Al concentrations, the film presented a FCC crystalline structure; nevertheless, as Al was increased, the structure presented a mix of FCC and HCP phases. On the other hand, an increase in bias voltage produced a decrease films thickness due to an increase in collisions. Moreover, the grain size and roughness were also strongly influenced by bias voltage. Propiedades morfológicas y estructurales de recubrimientos nitruro de titanio aluminio producidos por magnetron sputtering tríodo Resumen Se crecieron recubrimientos de TixAl1−xN empleando la técnica de magnetron sputtering tríodo, variando el voltaje de polarización entre -40 V y -150V. Por medio de espectroscopía de energía dispersiva, difracción de rayos x y miscroscopía de fuerza atómica, se analizó la influencia del voltaje de polarización sobre las propiedades morfológicas y estructurales de los recubrimientos. A medida que el voltaje bias se incrementó, se observó un aumento en el porcentaje atómico de Al, compitiendo con la concentración de Ti y produciendo cambios estructurales. A bajas concentraciones de Al, la pelćula exhibió una estructura cristalina FCC; sin embargo, a medida que le porcentaje de Al disminuyó, se pudo detectar una mezcla de fases FCC y HCP. Por otro lado, el incremento en el voltaje de polarización produjo una disminución en el espesor de las películas, debido al aumento en el número de colisiones. Además, el tamaño de grano y la rugosidad se vieron fuertemente afectados por el voltaje bías.Palabras clave: TiAlN; voltaje de polarización; sputtering; procentaje atómico; XRD.

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Effects of r.f. bias and nitrogen flow rates on the reactive sputtering of TiA1N films

Cited by 52 publications

References 34 publications

Characterization and temperature controlling property of TiAlN coatings deposited by reactive magnetron co-sputtering

Characterization and temperature controlling property of TiAlN coatings deposited by reactive magnetron co-sputtering

The Mechanical and Tribology Properties of Sputtered Titanium Aluminum Nitride Coating on the Tungsten Carbide Insert Tool in the Dry Turning of Tool Steel

Structural and Morphological Properties of Titanium Aluminum Nitride Coatings Produced by Triode Magnetron Sputtering

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