Effects of polishing pressure and sliding speed on the material removal mechanism of single crystal diamond in plasma-assisted polishing

Liu, Nian; Sugimoto, Kentaro; Yoshitaka, Naoya; Yamada, Hideaki; Sun, Rongyan; Kawai, Kentaro; Arima, Kenta; Yamamura, Kazuya

doi:10.1016/j.diamond.2022.108899

Cited by 23 publications

(5 citation statements)

References 58 publications

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“…While PAP exhibits potential as an effective and safe technique for the machining of SCD substrates, the significance of the sliding speed and polishing pressure in the material removal process remains uncertain. Addressing this, N. Liu et al investigated the impact of the pressure and sliding speed on diamond material removal during PAP polishing [111]. Their findings revealed that higher polishing pressure or sliding speeds between the polished plate and substrate could enhance the MRR, and controlled pressure classification could yield an ultra-smooth surface devoid of a damaged layer, achieving final surface roughness of 0.3 nm, with an MRR reaching as high as 5.3 µm/h.…”

Section: Plasma Polishingmentioning

confidence: 99%

A Review of Emerging Technologies in Ultra-Smooth Surface Processing for Optical Components

Li,

Xin,

Fan

et al. 2024

Micromachines

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Advancements in astronomical telescopes and cutting-edge technologies, including deep ultraviolet (DUV) and extreme ultraviolet (EUV) lithography, have escalated demands and imposed stringent surface quality requirements on optical system components. Achieving near-ideal optical components requires ultra-smooth surfaces with sub-nanometer roughness, no sub-surface damage, minimal surface defects, low residual stresses, and intact lattice integrity. This necessity has driven the rapid development and diversification of ultra-smooth surface fabrication technologies. This paper summarizes recent advances in ultra-smooth surface processing technologies, categorized by their material removal mechanisms. A subsequent comparative analysis evaluates the roughness and polishing characteristics of ultra-smooth surfaces processed on various materials, including fused silica, monocrystalline silicon, silicon carbide, and sapphire. To maximize each process’s advantages and achieve higher-quality surfaces, the paper discusses tailored processing methods and iterations for different materials. Finally, the paper anticipates future development trends in response to current challenges in ultra-smooth surface processing technology, providing a systematic reference for the study of the production of large-sized freeform surfaces.

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Section: Plasma Polishingmentioning

confidence: 99%

A Review of Emerging Technologies in Ultra-Smooth Surface Processing for Optical Components

Li,

Xin,

Fan

et al. 2024

Micromachines

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“…In 2011, Yamamura et al [118] proposed the PAP method for SCD surfaces. Liu et al [119] fabricated a device for PAP of SCD, as shown in figures 8(a) and (b). The device creates Ar-based plasma through the radio frequency electric field between the upper electrode and the lower rotating disc and polishes diamond through the chemical and mechanical action between the polishing disc and the substrate under the assistance of plasma.…”

Section: Papmentioning

confidence: 99%

“…Currently, PAP is only successfully used for polishing SCD substrates. In [46,51,119,120], Ar-based oxygen plasma was selected for the PAP of diamond. The polishing accuracy of PAP is extremely high, and [46] the surface roughness Sq of the polished SCD surface is below 0.5 nm, with a maximum MRR of 13.3 µm h −1 .…”

Section: Papmentioning

confidence: 99%

“…Using a quartz glass polishing plate, the minimum surface roughness Sq was achieved to be 0.4 nm, while using sapphire polishing plate, it was 0.13 nm. Liu et al [119] examined the influence of polishing pressure and rotation speed of the polishing plate on the polishing quality. As illustrated in figures 24(a) and (b), the diamond surface after PAP exhibits grooves in the <100> direction with a change in sliding speed at a polishing pressure of 246.9 kPa, whereas no grooves are observed on the diamond surface at a polishing pressure of 62.5 kPa.…”

Section: Polishing Platementioning

confidence: 99%

See 1 more Smart Citation

Energy beam-based direct and assisted polishing techniques for diamond: A review

Li,

Jiang,

Jiang

et al. 2023

Int. J. Extrem. Manuf.

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Diamond is a highly valuable material with diverse industrial applications, particularly in the fields of semiconductor, optics, and high-power electronics. However, its high hardness and chemical stability make it difficult to realize high-efficiency and ultra-low damage machining of diamond. To address these challenges, several polishing methods have been developed for both single crystal diamond (SCD) and polycrystalline diamond (PCD), including mechanical, chemical, laser, and ion beam processing methods. In this review, the characteristics and application scope of various polishing technologies for SCD and PCD are highlighted. Specifically, various energy beam-based direct and assisted polishing technologies, such as laser polishing, ion beam polishing, plasma-assisted polishing, and laser-assisted polishing, are summarized. The current research progress, material removal mechanism, and influencing factors of each polishing technology are analyzed. Although some of these methods can achieve high material removal rates or reduce surface roughness, no single method can meet all the requirements. Finally, the future development prospects and application directions of different polishing technologies are presented.

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“…Diamond devices are fabricated using plasma and thermochemical methods. ,− Recently, a plasma-assisted quartz polishing of diamond that produces atomically smooth and damage-free surfaces has been developed. , While these methods were able to produce precise and high-quality diamond components and devices, their efficiency is still lower compared to the methods used in the fabrication of conventional materials like silicon. All of these methods fundamentally involve diamond oxidation reaction.…”

Section: Introductionmentioning

confidence: 99%

Origin of the Surface Facet Dependence in the Oxidative Etching of the Diamond (111) and (100) Surfaces from First-Principles Calculations

Enriquez,

Yamasaki,

Michiuchi

et al. 2024

J. Phys. Chem. C

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This work elucidates the surface facet dependence on the oxygen adsorption and oxidized surface morphology of the diamond ( 111) and (100) surfaces to give insights that will improve the polishing, etching, and fabrication of diamond devices. We used spin-polarized density functional theory to systematically simulate the O adsorption and CO and CO 2 desorption reactions from pristine and etched diamond ( 111) and ( 100) surfaces. The results show that the surface facet dependence is caused by two factors: (1) the difference in the reactivity of the O 2 and (2) the difference in the carbonyl orientation of the O-terminated surfaces. The O 2 adsorption and activation energies on the C(111)-(2 × 1) surface are weaker and higher, respectively, compared to those on the C(100)-(2 × 1) surface. Moreover, the O 2 adsorption energy on the C(111)-(2 × 1) weakens with O 2 coverage. At monolayer O coverage, the carbonyl groups on the C(111)-(1 × 1):O surface have an inclined orientation which causes high steric repulsion between adjacent O atoms. The repulsion decreases with less neighboring molecules, leading to staggered etching, formation of islands, and loss of well-defined crystallographic orientation of the surface atoms. For the C(100)-(1 × 1):O surface, the carbonyl groups have an upright orientation and have low steric repulsion. The CO desorption activation energy is lower near an existing vacancy, leading to rowwise etching, which preserves the crystallographic orientation of the surface atoms.

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Effects of polishing pressure and sliding speed on the material removal mechanism of single crystal diamond in plasma-assisted polishing

Cited by 23 publications

References 58 publications

A Review of Emerging Technologies in Ultra-Smooth Surface Processing for Optical Components

A Review of Emerging Technologies in Ultra-Smooth Surface Processing for Optical Components

Energy beam-based direct and assisted polishing techniques for diamond: A review

Origin of the Surface Facet Dependence in the Oxidative Etching of the Diamond (111) and (100) Surfaces from First-Principles Calculations

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