2021
DOI: 10.1007/s11090-021-10206-2
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Effects of Oxygen (O2) Plasma Treatment in Promoting the Germination and Growth of Chili

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Cited by 18 publications
(23 citation statements)
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“…This damage hurts the seeds’ germination and growth; higher electrical conductivity is also associated with more dead seeds, as reported elsewhere 15 . On the other hand, a moderate rise in electrical conductivity was associated with the positive interaction between water uptake and active plasma species introduced on the seed surface by cold plasma-treatment as described in our previous studies 10 , 16 , 17 . This moderate rise in electrical conductivity is useful for germination and growth; the leaching of nutrients and sugar contents was useful to provide the initial energy for germination 17 .…”
Section: Resultssupporting
confidence: 60%
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“…This damage hurts the seeds’ germination and growth; higher electrical conductivity is also associated with more dead seeds, as reported elsewhere 15 . On the other hand, a moderate rise in electrical conductivity was associated with the positive interaction between water uptake and active plasma species introduced on the seed surface by cold plasma-treatment as described in our previous studies 10 , 16 , 17 . This moderate rise in electrical conductivity is useful for germination and growth; the leaching of nutrients and sugar contents was useful to provide the initial energy for germination 17 .…”
Section: Resultssupporting
confidence: 60%
“…Increase in water uptake was also attributed to the effect of vacuum because the seeds were simultaneously exposed to vacuum during low-pressure plasma-treatment. The physical and chemical changes on the seeds acted simultaneously to facilitate the seed germination and growth, as investigated in our previous studies 10 , 16 . However, ageing deteriorated these enhanced properties amongst the plasma-treated seeds, which were reflected by a decrease in the measurement values of the different tests explained in methodology section for 60 days, albeit still higher than the untreated values.…”
Section: Discussionmentioning
confidence: 91%
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“…For the high-resolution spectra, the peak deconvolutions of C 1 s spectra were fitted using Gaussian curve fitting. During component fitting, the Shirley background was used to deduce the C 1 s spectra, and the full width at half maximum was set between 1.46 and 1.55 eV [ 39 , 40 ].…”
Section: Methodsmentioning
confidence: 99%
“…Plasma ablation is the plasma-aided surface etching of materials, very similar to sputtering, without using any liquid etchant. A major share of plasma etching has been carried out with oxygen plasma [ 181 , 182 , 183 ] where oxygen, the precursor gas, was channeled into a vacuum chamber. During the process, the most peripheral layer of the substrate is etched off, and accordingly, a negligibly small weight loss occurs [ 184 , 185 ].…”
Section: Plasma Surface Modification (Psm)mentioning
confidence: 99%