2016
DOI: 10.2494/photopolymer.29.643
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Effects of Oxygen Microbubbles on Photoresist Layers under Hot Water Conditions

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Cited by 2 publications
(1 citation statement)
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“…The details of MBs generation system have been described elsewhere. [24][25][26][27][28] Pressure for MBs generation was set to 5 MPa. When investigating the effect of MBs, MBs was first generated in pure water to avoid the vaporization of phenol during the preparation process of MBs.…”
Section: Decomposition Of 4-chlorophenol and Phenol By Underwater Pul...mentioning
confidence: 99%
“…The details of MBs generation system have been described elsewhere. [24][25][26][27][28] Pressure for MBs generation was set to 5 MPa. When investigating the effect of MBs, MBs was first generated in pure water to avoid the vaporization of phenol during the preparation process of MBs.…”
Section: Decomposition Of 4-chlorophenol and Phenol By Underwater Pul...mentioning
confidence: 99%