2012
DOI: 10.1016/j.phpro.2012.03.619
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Effects of Oxygen Flux on the Aluminum Doped Zinc Oxide Thin Films By Direct Current Magnetron Sputtering

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Cited by 8 publications
(1 citation statement)
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“…A decrease in the sheet resistances of the AZO thin films is observed for thickness ranges from 487 to 634 nm. Therefore, a corresponding decrease in the resistivity is partly due to the presence of defects and majorly to Al dopants located as interstitial atoms and hence substitute Zn, and filling Oxygen vacancies [24]. This may be due to the donor states created as a result of the Al 3+ ions impurity introduced in the ZnO lattice structure, producing in all cases an n-type semiconductor [4].…”
Section: Electrical Propertiesmentioning
confidence: 99%
“…A decrease in the sheet resistances of the AZO thin films is observed for thickness ranges from 487 to 634 nm. Therefore, a corresponding decrease in the resistivity is partly due to the presence of defects and majorly to Al dopants located as interstitial atoms and hence substitute Zn, and filling Oxygen vacancies [24]. This may be due to the donor states created as a result of the Al 3+ ions impurity introduced in the ZnO lattice structure, producing in all cases an n-type semiconductor [4].…”
Section: Electrical Propertiesmentioning
confidence: 99%