2014
DOI: 10.1021/am506436s
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Effects of Nonequilibrium Growth, Nonstoichiometry, and Film Orientation on the Metal-to-Insulator Transition in NdNiO3 Thin Films

Abstract: Next-generation devices will rely on exotic functional properties not found in traditional systems. One class of materials of particular interest for applications are those possessing metal-to-insulator transitions (MITs). In this work, we probe the relationship between variations in the growth process, subsequent variations in cation stoichiometry, and the MIT in NdNiO3 thin films. Slight variations in the growth conditions, in particular the laser fluence, during pulsed-laser deposition growth of NdNiO3 prod… Show more

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Cited by 51 publications
(58 citation statements)
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References 40 publications
(98 reference statements)
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“…Figure 5a) and volume than the more stoichiometric ones. This is compatible with the increase of the (out-of-plane) Ni-O-Ni bond angles towards 180 • suggested from the XPS analysis and, consistent with the results of Breckenfeld et al 16 Beyond the influence of the experimentally observed Nd excess on the electronic properties of the NNO films grown from a mixed-phase target, it proved difficult to provide a satisfactory explanation for the deviation of the films composition from stoichiometry. PLD is a non-equilibrium process, and using mixed phase targets may result in preferential ablation of one component.…”
Section: -8 Preziosi Et Alsupporting
confidence: 82%
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“…Figure 5a) and volume than the more stoichiometric ones. This is compatible with the increase of the (out-of-plane) Ni-O-Ni bond angles towards 180 • suggested from the XPS analysis and, consistent with the results of Breckenfeld et al 16 Beyond the influence of the experimentally observed Nd excess on the electronic properties of the NNO films grown from a mixed-phase target, it proved difficult to provide a satisfactory explanation for the deviation of the films composition from stoichiometry. PLD is a non-equilibrium process, and using mixed phase targets may result in preferential ablation of one component.…”
Section: -8 Preziosi Et Alsupporting
confidence: 82%
“…This result is consistent with previous reports of cationic off-stoichiometry in NNO films using Rutherford backscattering spectrometry. 16 We note that even sample C shows some content of Ni 2+ . In view of the excellent transport properties of this sample, this small deviation from pure 3+ valence probably Ni-2p and Nd-3d higher resolved scans for A and C films are depicted in (b) and (c), respectively.…”
Section: Fig 3 Transport Characterization Of the Five Nno Thin Filmmentioning
confidence: 73%
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“…Both of these features have been previously observed in undoped nickelate films. 17,34 The cross-sectional HAADF STEM image of this film reveals that it is densely populated with vertical RP-type faults ( Figure 1(c)). These defects are formed when an AO rocksalt layer (where A corresponds to the A-site cation) stabilizes in between the perovskite layers.…”
Section: Introductionmentioning
confidence: 99%