2018
DOI: 10.1063/1.5045668
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Effects of nitrogen on the interface density of states distribution in 4H-SiC metal oxide semiconductor field effect transistors: Super-hyperfine interactions and near interface silicon vacancy energy levels

Abstract: The performance of silicon carbide (SiC)-based metal-oxide-semiconductor field-effect transistors (MOSFETs) is greatly enhanced by a post-oxidation anneal in NO. These anneals greatly improve effective channel mobilities and substantially decrease interface trap densities. In this work, we investigate the effect of NO anneals on the interface density of states through density functional theory (DFT) calculations and electrically detected magnetic resonance (EDMR) measurements. EDMR measurements on 4H-silicon c… Show more

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Cited by 8 publications
(8 citation statements)
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“…In addition, our Si vacancy levels also appear closer to the band edges than prior jellium-based studies. Our Si vacancy levels are in close agreement with experimental levels, suggesting that the difference in cell size or DFT functional matters more than charge correction scheme for such systems [21,22,[26][27][28]. This observation may be crucial for future research into similar metal-doped semiconductors, whenever a choice may be required between charge correction schemes and lattice size and relaxation, or when selecting between an LDA or GGA-PBE implementation of DFT.…”
Section: Comparison To Prior Resultssupporting
confidence: 78%
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“…In addition, our Si vacancy levels also appear closer to the band edges than prior jellium-based studies. Our Si vacancy levels are in close agreement with experimental levels, suggesting that the difference in cell size or DFT functional matters more than charge correction scheme for such systems [21,22,[26][27][28]. This observation may be crucial for future research into similar metal-doped semiconductors, whenever a choice may be required between charge correction schemes and lattice size and relaxation, or when selecting between an LDA or GGA-PBE implementation of DFT.…”
Section: Comparison To Prior Resultssupporting
confidence: 78%
“…Our results agree with prior LMCC studies on the similarly structured hexagonal polytype 2H-SiC, which place the −1/−2 acceptor level closer to the conduction band edge [21]. For the Si vacancy and Cr defects, our results for the previously studied metals have less absolute error when compared with experimentally attributed defect levels, and what error does exist tends to place these levels closer to the band edges rather than deeper into the gap [11,12,19,21,22,24]. The notable exception is vanadium, for which we find the acceptor to be an even deeper level than previously calculated and the donor to be a shallower level.…”
Section: Charged Statessupporting
confidence: 92%
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