Effects of Ne+ implantation and rapid thermal annealing on the microstructure and electrical properties of YBCO thin films

Li, Y. H.; Staton‐Bevan, A. E.; Tate, T.J.; Lee, M. J.; Li, Yupu; Kilner, John A.; Somekh, R.E.

doi:10.1007/bf00264070

J Mater Sci Lett

1996

DOI: 10.1007/bf00264070

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Effects of Ne+ implantation and rapid thermal annealing on the microstructure and electrical properties of YBCO thin films

Y. H. Li

A. E. Staton‐Bevan

T.J. Tate

et al.

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Effects of Ne+ implantation and rapid thermal annealing on the microstructure and electrical properties of YBCO thin films

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References 5 publications

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