2000
DOI: 10.1116/1.591242
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Effects of molecular properties on nanolithography in polymethyl methacrylate

Abstract: High-resolution lithographic performance of polymethyl methacrylate (PMMA) of molecular weights (MWs) of 50, 100, 496, and 950 K is compared. A chain scission model is used to analyze the behavior of the four molecular weight resists. The chain scission model is combined with an empirical dissolution model to successfully describe the edge profile of a bar pattern. Isolated linewidth data for the 100 and 496 K resists both fit a Monte Carlo code generated linespread function that was convolved with a Gaussian … Show more

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Cited by 76 publications
(66 citation statements)
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“…Gray-scale EBL patterning can also be obtained by using a fixed accelerating voltage and by locally changing the exposure dose. Given that the molecular weight M of the resist changes during the e-beam irradiation [58], modulating the lateral distribution of M by controlling the deposited dose is now possible. During development, the resist is immersed into a solution with etching selectivity depending on M; thus, variation of M is revealed as resist height modulation [59][60][61].…”
Section: Focused Electron Beams: Towards 3d Nanostructuresmentioning
confidence: 99%
“…Gray-scale EBL patterning can also be obtained by using a fixed accelerating voltage and by locally changing the exposure dose. Given that the molecular weight M of the resist changes during the e-beam irradiation [58], modulating the lateral distribution of M by controlling the deposited dose is now possible. During development, the resist is immersed into a solution with etching selectivity depending on M; thus, variation of M is revealed as resist height modulation [59][60][61].…”
Section: Focused Electron Beams: Towards 3d Nanostructuresmentioning
confidence: 99%
“…1). For even smaller D, irregularities in PMMA (∼5 nm [23]) became comparable in size with the designed features and, unavoidably on this scale, we could only estimate the device geometry. The measurements discussed below were carried out by using the standard lock-in technique with dc bias over a T range from 0.3 to 300K.…”
mentioning
confidence: 99%
“…The reflow temperature is usually set to be close to the highest T g within these polymer regions. In the variation of TASTE used in this work, the simultaneous change of the molecular weight M w [13,7] and the T g [7] due to electron beam exposure of thermoplastic resists is exploited. Doses required for certain step heights are extracted from the resist contrast curve.…”
Section: Taste Processmentioning
confidence: 99%