Effects of Magnetic Field on the Electroless Nickel/Cobalt Deposition

Lee, Chia-Chien; Chou, Tse‐Chuan

doi:10.1021/ie970706a

Cited by 9 publications

(7 citation statements)

References 6 publications

(15 reference statements)

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“…To date Co and Ni thin films have been deposited using a variety of techniques including sputtering, ,, evaporation, , electrodeposition, , and chemical vapor deposition. ,− CVD is attractive for the most demanding applications as it offers the potential for conformal coverage in confined geometries and high film purity. Options for Co CVD are limited, however, because useful precursors exhibit limited volatility, and deposition temperatures are often high.…”

Section: Introductionmentioning

confidence: 99%

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Reactive Deposition of Cobalt and Nickel Films from Their Metallocenes in Supercritical Carbon Dioxide Solution

Hunde

Watkins

2004

Chem. Mater.

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High-purity Co and Ni thin films were deposited directly onto the native oxide of Si wafers and onto TaN and TiN films supported on Si wafers by the hydrogen reduction of their respective metallocenes in supercritical CO 2 solution using a batch, cold-wall chemical fluid deposition (CFD) reactor. For Co deposition from bis(cyclopentadienyl)cobalt, substrate temperatures ranged between 285 and 320 °C and reactor pressures were 220-260 bar. For Ni deposition from bis(cyclopentadienyl)nickel, substrate temperatures were 175-200 °C and reactor pressures were 190-230 bar. In all cases, the reactor wall temperatures were maintained between 90 and 120 °C, restricting the depositions to the heated substrates only. The deposited films were characterized by SEM, XRD, and XPS. The films were found to be essentially free from ligand-derived contamination.

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Section: Introductionmentioning

confidence: 99%

“…To date Co and Ni thin films have been deposited using a variety of techniques including sputtering, 1,3,14 evaporation, 9,15 electrodeposition, 16,17 and chemical vapor deposition. demanding applications as it offers the potential for conformal coverage in confined geometries and high film purity.…”

Section: Introductionmentioning

confidence: 99%

Reactive Deposition of Cobalt and Nickel Films from Their Metallocenes in Supercritical Carbon Dioxide Solution

Hunde

Watkins

2004

Chem. Mater.

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“…Although Ni morphology, topology, and surface chemistry are critically important for these applications, their control is limited by: 1) Ni deposition conditions and treatments, [7][8][9] and 2) properties and available architectures of sacrificial metallization templates, [1,6,[10][11][12][13] (Fig. 1B-C).…”

mentioning

confidence: 99%

Noncovalent Deposition of Nanoporous Ni Membranes on Spatially Organized Poly(p‐xylylene) Film Templates

et al. 2007

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Nickel metal is widely used in catalytic, [1,2] energy storage, [3,4] and optical applications [5,6] due to its favorable physicochemical properties. Although Ni morphology, topology, and surface chemistry are critically important for these applications, their control is limited by: 1) Ni deposition conditions and treatments, [7][8][9] and 2) properties and available architectures of sacrificial metallization templates, [1,6,[10][11][12][13] (Fig. 1B-C). Here, we present our initial results relating to the fabrication and characterization of nanoporous Ni membranes templated by conformal electroless (EL) metallization of poly(chloro-p-xylylene) (PPX-C) NTFs. EL metallization of polymer films is typically a multistep process [16] involving: 1) chemical or mechanical surface microroughening to promote metal adhesion; 2) adsorption of Pd/Sn core/shell colloids to the surface; 3) selective dissolution of the Sn II/IV b-hydroxy shell segment not anchoring the colloid to the surface to expose the catalytic Pd 0 core; and finally 4) solution deposition of EL metal. For NTFs, however, the need to minimize potential damage to film nanoarchitectures ( Fig. 1), eliminate environmentally hazardous Sn salts, and reduce process steps and costs necessitates consideration of an alternate EL plating procedure. In one such process, [17][18][19][20][21] solvent-templated sites tailored to adsorb catalyst-binding pyridine ligands are first created at a polymer surface during film formation. Partitioning of pyridine from aqueous solution into these sites, driven by maximization of hydrophobic van der Waals and p-p interactions with the polymer aromatic functional groups that define the sites, noncovalently binds pyridine ligands at the polymer surface. Because the hydrophilic N site of the adsorbed pyridine remains accessible to aqueous solution, covalent binding of Pd II EL COMMUNICATION

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“…In some cases, magnetic field is essential and part of the mechanism, e. g. magnetron sputtering [25][26][27][28][29][30][31]. In other cases, magnetic field played a role of external factor that influenced the growth of thin films such as depositions from ionic solutions [32][33][34], different types of electro deposition [35][36][37][38][39], redox deposition [40][41][42], electrophoresis [43], as well as influencing particles in the plumes produced in pulsed-laser depositions [44][45][46][47], and alterations of the plasma in plasma enhanced chemical vapor deposition processes [48][49][50][51].…”

Section: Introductionmentioning

confidence: 99%

The influence of external magnetic field on the structural and optical properties of nanocrystalline ZnO thin films prepared by dip coating method

Al-Arfaj

Subahi

2015

Superlattices and Microstructures

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Effects of Magnetic Field on the Electroless Nickel/Cobalt Deposition

Cited by 9 publications

References 6 publications

Reactive Deposition of Cobalt and Nickel Films from Their Metallocenes in Supercritical Carbon Dioxide Solution

Reactive Deposition of Cobalt and Nickel Films from Their Metallocenes in Supercritical Carbon Dioxide Solution

Noncovalent Deposition of Nanoporous Ni Membranes on Spatially Organized Poly(p‐xylylene) Film Templates

The influence of external magnetic field on the structural and optical properties of nanocrystalline ZnO thin films prepared by dip coating method

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