Effects of ion beam treatment on atomic and macroscopic adhesion of copper to different polymer materials

Biogeochemistry of mineral–organic associations across a long-term mineralogical soil gradient (0.3–4100kyr), Hawaiian Islands

“…The increasing aromatic C content with depth agrees well with the idea of aromatic compounds possessing a high affinity to oxide-type minerals (Kaiser and Guggenberger, 2000;Chorover and Amistadi, 2001;Mikutta et al, 2007;Scheel et al, 2008), hence, with their larger propensity to accumulate more directly at the mineral-organic interface. Of note, carboxylic C declined slightly with depth (Table 4), possibly indicating their preferential removal upon Ar + treatment (Zaporojtchenko et al, 2007).…”

“…Since abrasion is not likely to destroy the microaggregate structure, the observed shifts in C functional groups with sputter time reflects differences in the molecular structure of MOM. It is known that Ar + gassing under ultrahigh vacuum conditions can induce chemical modifications of synthetic polymers such as the selective removal of phenyl rings (Zaporojtchenko et al, 2005(Zaporojtchenko et al, , 2007. Also, polymers exposed to Ar plasma revealed a decrease in aromatic C in favor of aliphatic C (France and Short, 1998).…”

“…Also, polymers exposed to Ar plasma revealed a decrease in aromatic C in favor of aliphatic C (France and Short, 1998). Beside polymer scission and the formation of cross-linkings, ion treatment can also cause the removal of oxygen-functional groups depending on the polymer's structure (Zaporojtchenko et al, 2007). We therefore examined OM extracted from the 0.3-kyr MOA by means of NaOH-NaF in order to test for the effect of Ar + irradiation on the chemical composition of LSAG-specific natural OM.…”

Surface Roughening of Polystyrene and Poly(methyl methacrylate) in Ar/O2 Plasma Etching

“…For example, one of the observed differences between PS and PMMA is the degree of cross-linking following plasma exposure. In the case of PS, surface cross-linking is prevalent, while in PMMA, chain scissioning and depolymerization dominate [13,14,16]. While chemical structures such as the aromatic ring in PS and the methyl ester group in PMMA are commonly believed to play important roles in etching behaviors such as etch rate, cross-linking and chain scission, most studies reporting a correlation between chemical structures and etch behaviors of polymers are based on indirect observations, including change in molecular weight [16], etch rate [13,19], interface adhesion [14,16] or diffusion coefficient [20].…”

Laser Confocal and Spatially-Resolved Fluorescence Spectroscopy of Porphyrin Distribution on Plasma Deposited Polymer Films

“…[26,28] Typically, in order to elucidate the fundamental mechanisms occurring in a revolutionary plasma deposition process, atmospheric pressure plasma deposition as well as to analyze biofunctionalized polymer surfaces, spectral methods (X-ray photoelectron spectroscopy, Fourier transform infrared spectroscopy, atomic force microscopy, quadrupole mass spectrometry and others) as well as nonspectral methods (contact angle, 90° peel tests, dye assays, biological assays, and zeta potential) are being used. [26,[28][29][30] In this report, we present the results showing the possibilities of the modern experimental methods such as laser confocal microscopy and spatial-resolved fluorescence spectroscopy for the study of the interaction of biologically active molecules, di(p-aminophenyl)etioporphyrin (DAPEP) and tetra(p-aminophenyl)porphyrin (TAPP), with the surface of thin (7.2-15 m) polypropylene films treated by 0.5 M KCl solution and activated by air non-equilibrium plasma at normal atmospheric pressure. Specifically, these methods open the possibility to control the distribution of active organic component on the film surface as well as to discriminate the nature (monomeric or aggregated forms) of adsorbed molecular species.…”