Proceedings of Technical Papers. International Symposium on VLSI Technology, Systems, and Applications
DOI: 10.1109/vtsa.1997.614746
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Effects Of Hydrogen Annealing On Data Retention Time For High Density Drams

Abstract: In this work the improvement of DRAM data retention time through the decrease of junction leakage currents using Hz-annealed wafers is reported for the first time. Wafers used in this work are conventional CZ and H,-annealed wafers, and they were processed together in high density DRAM fabrication for comparison. It has been shown that refresh time has been significantly improved for H2-annealed wafers. Parameters related to junction leakage have been measured and better junction quality has been achieved for … Show more

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Cited by 3 publications
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“…Schemes that reduce leakage current by optimizing process conditions or by controlling the potential of various nodes in the cell have been reported in [8,3]. Schemes for dynamically controlling the refresh period through a limited number of temperature or current sensors have been reported in [11,14].…”
Section: Introductionmentioning
confidence: 99%
“…Schemes that reduce leakage current by optimizing process conditions or by controlling the potential of various nodes in the cell have been reported in [8,3]. Schemes for dynamically controlling the refresh period through a limited number of temperature or current sensors have been reported in [11,14].…”
Section: Introductionmentioning
confidence: 99%