Effects of hot isostatic pressure on titanium nitride films deposited by physical vapor deposition

Abstract

Films of titanium nitride deposited by physical vapor deposition on 304 L stainless steel substrates were hot isostatic pressed (HIP) under 150 MPa at 550 °C. To study the effects of this treatment on the microstructure of those films, X-ray diffraction analyses, Rutherford Backscattering spectroscopy, scanning electron microscopy, and atomic force microscopy were performed. Surface hardness, and roughness were also evaluated to characterize the TiN properties. The hot isostatic pressure leads to an increase of hardness for depths up to 0.1 mum and a crystallographic texture change from (111) to (200). The original TiN golden color turned to red after the treatment. An increase of the grain size has been observed for hot isostatic pressed samples, but the stoichiometry of the TiN film was determined to be 1:1 by RBS. The microstructure observed by atomic force microscopy indicated that the TiN film surface is smoother after the HIP treatment

Effect of high pressure on the solid–liquid phase change of a nickel base superalloy during hot isostatic pressing

“…As a result of this process, the preferred crystallographic orientation 0 0 1 seems to have been replaced by 0 1 1 . As was mentioned previously, hot isostatic pressure can induce a change in the crystallographic texture [10]. This kind of change was also found for the same DS alloy homogenized at 1230 • C, and subsequently precipitation heat treated at 900 • C under high pressure of 120 MPa [20].…”

“…Hence, from the experimental results observed so far, it can be summarized that hot isostatic pressure has a great influence not only on the metallography but also on the crystallography of the alloy upon phase transition. Carbonari and Martinelli [10] also reported such a HIPing effect on the crystallographic texture for TiN films deposited by the PVD process and subsequently HIPed at 150 MPa. XRD patterns for these coatings showed a distinctive decrease in the peak intensity for (1 1 1) plane, and an increase in the intensity for (2 0 0) plane after HIPing.…”

Optical Properties and Microstructure of TiNxOy and TiN Thin Films before and after Annealing at Different Conditions

“…The SS substrate showed (111) peak at angle 2θ = 44.49. Different angles of TiN peaks are reported in literature [12,16,24,29] (as shown in Table 2), this is probably due to the different stichometry of TiN structure obtained from different manufacturing techniques of thin film. The lattice parameter of the as-deposited TiN with an austenitic microstructure was calculated by Bragg's Law for the (111), (200), and (220) peaks and was found to be 3.6 Å [29].…”

“…Their optical performance will be shown later to be also different. The TiN stoichiometry relationships are explained [12], according to the TiN phase diagram, that by increasing the nitrogen concentration, the titanium lattice expands in order to accommodate dissolved nitrogen atoms; the maximum concentration being 23 at % at 1050 • C, corresponding to a ratio N/Ti = 0.3. For nitrogen concentrations of 33 at %, and temperatures lower than 1050 • C, the Ti 2 N phase with a body center tetragonal structure can be observed.…”

“…Alternatively, Titanium Nitride (TiN) films, which share TiN x O y many properties such as the dielectric properties can be used a candidate material for SSA applications. TiN, the most popular transition metal nitride, has a golden color and is characterized as an extremely hard material, with a high melting point (2950 • C), high thermal and chemical stability at elevated temperatures, and ease to manufacture as compared to TiN x O y [11,12]. Several studies investigated the structure evolution and electrical properties of TiN thin films produced by different deposition parameters [13][14][15][16][17][18][19][20].…”