2017
DOI: 10.1088/1674-1056/26/12/125201
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Effects of gas pressure on plasma characteristics in dual frequency argon capacitive glow discharges at low pressure by a self-consistent fluid model

Abstract: A self-consistent fluid model for dual radio frequency argon capacitive glow discharges at low pressure is established. Numerical results are obtained by using a finite difference method to solve the model numerically, and the results are analyzed to study the effect of gas pressure on the plasma characteristics. It shows that when the gas pressure increases from 0.3 Torr (1 Torr = 1.33322×10 2 Pa) to 1.5 Torr, the cycle-averaged plasma density and the ionization rate increase; the cycle-averaged ion current d… Show more

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Cited by 13 publications
(5 citation statements)
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“…The gas pressure has a strong influence on plasma dynamics. Gas pressure is positively correlated with the resulting electron density, the electron temperature, and the plasma lifetime [Figure (a-c)]. Pressure has a strong effect on the oscillation in plasma, especially in the sheath region, and the amplitude of electron density is proportional to pressure.…”
Section: Key Variables Determine the Modification Of Photocatalysts W...mentioning
confidence: 99%
See 2 more Smart Citations
“…The gas pressure has a strong influence on plasma dynamics. Gas pressure is positively correlated with the resulting electron density, the electron temperature, and the plasma lifetime [Figure (a-c)]. Pressure has a strong effect on the oscillation in plasma, especially in the sheath region, and the amplitude of electron density is proportional to pressure.…”
Section: Key Variables Determine the Modification Of Photocatalysts W...mentioning
confidence: 99%
“…(a) Evolution of electron density at different gas pressures for 6000 cycles. Reproduced with permission from ref . Copyright 2017 IOP Science.…”
Section: Key Variables Determine the Modification Of Photocatalysts W...mentioning
confidence: 99%
See 1 more Smart Citation
“…Glow discharge plasma [1][2][3][4][5][6][7][8][9][10][11] produced by a powered DC or a RF source has various applications in industrial technologies and medical therapy. Among which, an improved discharge by the substance vapor deposition, a surface adaptation by different materials and the plasma etching.…”
Section: Introductionmentioning
confidence: 99%
“…Recently, a dualfrequency (DF) discharge plasma technology has been received extensive attention in atmospheric pressure discharge. For low pressure discharges, this technology, one RF of high frequency (HF) is much greater than that of low frequency (LF), and HF source determines the plasma density and LF source controls the ion energy [9][10][11][12][13]. For atmospheric pressure discharges, DF technology is taken to realize controlling plasma discharge parameters independently.…”
Section: Introductionmentioning
confidence: 99%