Effects of different acetylene/nitrogen ratios on characteristics of carbon coatings on optical fibers prepared by thermal chemical vapor deposition

Lee, Ren-Hung; Lai, Liang-Hsun; Shiue, Sham‐Tsong

doi:10.1016/j.tsf.2010.04.085

Cited by 12 publications

(11 citation statements)

References 30 publications

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“…During our experimental process, we discover that oxygen on the copper foil plays an important role in the phase, composition and morphology of carbon films. To our best knowledge, the effects of surface oxygen on the growth of carbon films by PECVD have not been discussed before [13][14][15][16].…”

Section: Introductionmentioning

confidence: 99%

Effects of surface oxygen on carbon films synthesized by plasma enhanced chemical vapor deposition

Wang

Chen

et al. 2016

Materials Letters

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Section: Introductionmentioning

confidence: 99%

Effects of surface oxygen on carbon films synthesized by plasma enhanced chemical vapor deposition

Wang

Chen

et al. 2016

Materials Letters

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“…The characteristics of thermal CVD carbon films are influenced by many factors including the precursor gas, mass flow rate of inlet gas, deposition temperature, and working pressure. [6][7][8][9][10] Methane (CH 4 ), 7,11,12 acetylene (C 2 H 2 ), 13 and ethylene (C 2 H 4 ) 14 are mostly adopted as the precursor gases for pyrolytic carbon deposition. Alternatively, propane (C 3 H 8 ) is clean, convenient, affordable, and effective, so it is extensively used in the industrial, commercial, residential, and agricultural sectors.…”

mentioning

confidence: 99%

Kinetics of Thermal Chemical Vapor Deposition and Microstructures of Carbon Films Using Propane/Ammonia Mixtures

Lai

Hsueh

et al. 2014

ECS J. Solid State Sci. Technol.

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This study investigates the correlation between thermal chemical vapor deposition kinetics and characteristics of smooth laminar carbon films using propane/ammonia (C 3 H 8 /NH 3 ) mixtures. During the deposition process, a residual gas analyzer is used to measure the partial pressures of residual gases. Experimental results indicate that the deposition rate raises with increasing the C 3 H 8 /(C 3 H 8 +NH 3 ) ratio, residence time, deposition temperature, and working pressure. NH 3 acts as both etcher and competing adsorber, which produces the suppressing effect. About sixteen NH 3 molecules will suppress one C 3 H 8 molecule to form the carbon film. Moreover, the pyrolysis of C 3 H 8 /NH 3 mixtures is dominated by about a first order process, which is arisen from the adsorption of main product gases methane (CH 4 ), acetylene (C 2 H 2 ), and ethylene (C 2 H 4 ) on the silica glass plate substrate. The activation energy of this process is 439 kJ/mol, so the dissociation of gas phase CH 4 is the rate limiting step in this process. Few nitrogen and hydrogen atoms are incorporated into carbon films. The crystallinity, degree of ordering, nano-crystallite size, and sp 2 /(sp 2 +sp 3 ) ratio of the carbon films decrease with increasing the C 3 H 8 /(C 3 H 8 +NH 3 ) ratio. Finally, the results of thermal CVD carbon deposition using C 3 H 8 /NH 3 mixtures are compared with those using CH 4

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“…13 Nevertheless, the ordering degree of carbon films using C 2 H 2 is lower, and the outlet of thermal CVD system is covered with contaminants including asphalts. 14,15 Ethylene (C 2 H 4 ) is an important product of petrochemical industry, and it is also often chosen as the precursor gas to prepare carbon films using different methods. [16][17][18][19][20][21][22] Alternatively, propane (C 3 H 8 ) is clean, convenient, affordable, and effective, and thus, it is extensively used in the industrial, commercial, residential, and agricultural sectors.…”

mentioning

confidence: 99%

“…Furthermore, the kinetics of thermal CVD process and the connection between the microstructure of carbon films and thermal CVD process are proposed. Finally, the thermal CVD carbon deposition using a C 3 H 8 /N 2 mixture is compared with those using CH 4 /N 2 , 11 C 2 H 2 /N 2 , 14 and C 2 H 4 /N 2 mixtures. 21…”

mentioning

confidence: 99%

Effects of Propane/Nitrogen Mixtures on Thermal Chemical Vapor Deposition Rates and Microstructures of Carbon Films

Lai

Chiou

Hsueh

et al. 2013

ECS J. Solid State Sci. Technol.

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When propane/nitrogen (C3H8/N2) mixtures are used to deposit carbon films by thermal chemical vapor deposition (CVD), effects of C3H8/(C3H8+N2) ratios on the deposition rate and microstructures of carbon films are investigated. Experimental results show that as the C3H8/(C3H8+N2) ratio increases from 20 to 100%, the deposition rate increases from 23.7 to 127 nm/min. Alternatively, if the residence time, deposition temperature, and working pressure raise, the deposition rate of carbon films also increases. The kinetics of this thermal CVD process is discussed. The activation energy obtained in this work is 234 kJ/mole. Furthermore, this CVD reaction is controlled by a process of about first order, which is resulted from the adsorption of main product gases, acetylene (C2H2) and ethylene (C2H4), on the silica glass plate substrate. Few nitrogen and hydrogen atoms are incorporated into carbon films. The crystallinity, ordering degree, and nano-crystallite size of carbon films decrease with increasing the C3H8/(C3H8+N2) ratio. Meanwhile, as the C3H8/(C3H8+N2) ratio increases from 20 to 100%, the sp2/(sp2+sp3) ratio of carbon films decreases from 92 to 61%. Finally, the results of thermal CVD carbon deposition using C3H8/N2 mixtures are compared with those using methane/nitrogen (CH4/N2), C2H2/N2, and C2H4/N2 mixtures

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Effects of different acetylene/nitrogen ratios on characteristics of carbon coatings on optical fibers prepared by thermal chemical vapor deposition

Cited by 12 publications

References 30 publications

Effects of surface oxygen on carbon films synthesized by plasma enhanced chemical vapor deposition

Effects of surface oxygen on carbon films synthesized by plasma enhanced chemical vapor deposition

Kinetics of Thermal Chemical Vapor Deposition and Microstructures of Carbon Films Using Propane/Ammonia Mixtures

Effects of Propane/Nitrogen Mixtures on Thermal Chemical Vapor Deposition Rates and Microstructures of Carbon Films

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