Effects of deposition parameters on HFCVD diamond films growth on inner hole surfaces of WC–Co substrates

Wang, Xinchang; Lin, Zichao; Shen, Bin; Sun, Fanghong

doi:10.1016/s1003-6326(15)63665-2

Cited by 18 publications

(5 citation statements)

References 45 publications

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“…For increasing methane concentrations and increasing process temperatures, the coating thicknesses after the deposition for 20 min also increase. This correlation is also reported for hot-filament CVD processes [14]. The increase of the coating thickness can be explained similarly to the crystal sizes.…”

Section: Discussionsupporting

confidence: 80%

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Interaction of Methane Concentration and Deposition Temperature in Atmospheric Laser Based CVD Diamond Deposition on Hard Metal

2019

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For laser-based plasma chemical vapour deposition (CVD) of diamond on hard metal at atmospheric pressure, without a vacuum chamber, the interaction between the deposition temperature and the methane concentration has to be understood to adjust the coating thickness, deposition duration, and medium diamond crystal size. The hypothesis of this study is that a wider range of methane concentrations could be used to deposit microcrystalline diamond coatings due to the increasing etching and deposition rates with rising deposition temperatures. The deposition of the CVD diamond coatings was carried out on K10 hard metal substrates. The process temperature and the methane concentration were varied from 650 to 1100 °C and from 0.15% to 5.0%, respectively. The coatings were analysed by scanning electron and 3D laser-scanning confocal microscopy, energy dispersive X-ray and micro-Raman spectroscopy, as well as cryofracture-based microscopy analysis. The results showed that microcrystalline diamond coatings could be deposited in a wider range of methane concentrations when increasing the process temperature. The coating thickness saturates depending on the process temperature even though the methane concentration constantly increases. The coating thickness increases with an increasing deposition temperature until the cobalt diffusion hinders the deposition at the process temperature of 1100 °C.

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Section: Discussionsupporting

confidence: 80%

“…However, with further increasing methane concentrations, the crystal size again reduces. This decline of the crystal size is also described for hot-filament CVD processes on WC-Co substrates [14]. At this point, the etching rate of hydrogen is not high enough anymore to completely etch the partly deposited amorphous bound carbon.…”

Section: Discussionsupporting

confidence: 52%

Interaction of Methane Concentration and Deposition Temperature in Atmospheric Laser Based CVD Diamond Deposition on Hard Metal

2019

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“…As can be observed in Figure 2 c, after acid etching pretreatment, the tool substrate surface is obviously roughened with many pits and holes. During the coating preparation process, these low-energy sites are beneficial to promote the nucleation and growth of diamond, while the rough substrate surface can increase the contact area between diamond grains and the substrate surface and enhance the mechanical occlusion effect between the coating and the substrate, thus improving the bonding force between the coating and the substrate [ 16 , 17 ].…”

Section: Experimental Results and Analysismentioning

confidence: 99%

Effect of Substrate Pretreatment Process on the Cutting Performance of Diamond-Coated PCB Micro-Milling Tools

Yang

Lin

et al. 2022

Micromachines

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Diamond coatings were deposited on PCB (printed circuit board) carbide milling tool substrates under various schemes of acid and alkali pretreatment by hot filament chemical vapor deposition (HFCVD). Scanning electron microscopy and X-ray coating analysis were used to examine the surface morphology of the milling tools and the impact of de-cobalt from the substrate surface after pretreatment. Milling experiments were carried out to study the cutting performance of diamond-coated PCB micro-milling tools under various pretreatment processes. The results show that abrasive wear, coating flaking, and cutting-edge chipping are the main failure forms of coated PCB milling tools. The substrate pretreatment process with 20 min of alkali etching followed by 20 s of acid etching allows the diamond-coated micro-milling tools to produce the best film–substrate adhesion and substrate strength. These milling tools also have the longest service lives and are suitable for the high-speed cutting processing of PCB.

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“…In nucleation, UNCD growth and BDNCD growth processes, relatively lower pressure is selected in order to increase mean free paths of active radicals forming around hot filaments, for which such radicals will undergo fewer collisions when moving to substrate surfaces and induce much higher nucleation density. 25,26 Moreover, mainly owing to the more exothermic reactions caused by the more radicals moving to the substrate surfaces, especially the recombination of H atoms that contributes much to the substrate temperature, at the same filament temperature, substrate temperatures in the nucleation, UNCD growth and BDNCD growth processes are higher than those in the UMCD and BDMCD growth processes. The filament temperature is approximately measured by the Raytek MR1SCSF double-color integrated infrared thermometer (range: 600 °C–3000 °C), and the substrate temperature is measured by Type K thermocouple (range: −200 °C to 1300 °C).…”

Section: Methodsmentioning

confidence: 99%

Development and growth time optimization of boron-doped micro-crystalline, undoped micro-crystalline and undoped nano-crystalline composite diamond film

Wang

Sun

2016

Proceedings of the Institution of Mechanical Engineers, Part B:

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Based on a well-designed growth procedure, a tri-material, namely, a three-layer boron-doped micro-crystalline, undoped micro-crystalline and undoped nano-crystalline composite diamond film, is deposited on the pretreated WC-6 wt% Co substrate, the basic characters of which are systematically studied and compared with some other commonly used diamond films. Besides, the growth times for three respective layers are accordingly determined. It is further clarified that the underlying boron-doped micro-crystalline diamond layer can well adhere to the WC-Co substrate due to either the reduction in the residual stress or the formation of B-Co compounds. There is no doubt that the surface undoped nano-crystalline diamond layer with relatively lower hardness and initial surface roughness is more convenient to be polished to the required surface roughness. Moreover, when the growth times for the middle undoped microcrystalline diamond layer and the surface undoped nano-crystalline diamond layer are both appropriate, the undoped micro-crystalline diamond layer with extremely high diamond quality and hardness can effectively reinforce the surface hardness of the whole composite film. Based on the discussions on the influences of the growth times for the different layers on the performance of the composite diamond film, the growth times for the boron-doped micro-crystalline diamond, undoped micro-crystalline diamond and undoped nano-crystalline diamond layers are, respectively, determined as 4, 4 and 2 h. Under such conditions, the reinforcement effect of the middle layer on the surface hardness can be guaranteed, and the undoped nano-crystalline diamond grains have totally covered the undoped micro-crystalline diamond layer.

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Effects of deposition parameters on HFCVD diamond films growth on inner hole surfaces of WC–Co substrates

Cited by 18 publications

References 45 publications

Interaction of Methane Concentration and Deposition Temperature in Atmospheric Laser Based CVD Diamond Deposition on Hard Metal

Interaction of Methane Concentration and Deposition Temperature in Atmospheric Laser Based CVD Diamond Deposition on Hard Metal

Effect of Substrate Pretreatment Process on the Cutting Performance of Diamond-Coated PCB Micro-Milling Tools

Development and growth time optimization of boron-doped micro-crystalline, undoped micro-crystalline and undoped nano-crystalline composite diamond film

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