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2022
DOI: 10.3390/cryst12121831
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Effects of Cr Concentration on the Structure and the Electrical and Optical Properties of Ti-Al-Cr-N Thin Films Prepared by Means of Reactive Co-Sputtering

Abstract: Thin films of Ti-Al-Cr-N were deposited onto glass substrates by means of the reactive magnetron co-sputtering of pure Cr and TiAl alloy targets in an atmosphere of Ar and N2. This investigation was carried out by adjusting the Cr-target power in order to increase the Cr amount in the films. The crystal structure of the films was investigated via X-ray diffraction (XRD). The elemental composition of the coatings was determined using Auger electron spectroscopy (AES). The electrical resistivity was measured usi… Show more

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(1 citation statement)
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“…The cutting inserts were pre-coated with a multifunctional electroconductive TiN coating of 3.8-4.0 µm thickness. The thickness of the coating was chosen based on practical experience, since coatings with a thickness of less than 1.8-2.0 µm exhibit uneven electroconductive properties when deposited on insulating ceramic samples [72]. At the same time, this classical composition of the TiN coating provides excellent wear-resistant properties [73].…”
Section: Multifunctional Coatingmentioning
confidence: 99%
“…The cutting inserts were pre-coated with a multifunctional electroconductive TiN coating of 3.8-4.0 µm thickness. The thickness of the coating was chosen based on practical experience, since coatings with a thickness of less than 1.8-2.0 µm exhibit uneven electroconductive properties when deposited on insulating ceramic samples [72]. At the same time, this classical composition of the TiN coating provides excellent wear-resistant properties [73].…”
Section: Multifunctional Coatingmentioning
confidence: 99%