Effects of carbon film roughness on growth of carbon nanotip arrays by plasma-enhanced hot filament chemical vapor deposition

Wang, B.B.; Zhang, B.

doi:10.1016/j.carbon.2006.02.004

Cited by 20 publications

(6 citation statements)

References 24 publications

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“…18,19,38,39 Here we will discuss the origin of the difference of the Raman spectra generated by different CNTPs and the plain carbon films.…”

Section: Discussionmentioning

confidence: 99%

“…18 The chamber contains three coiled hot ͑heated to about 1600°C͒ tungsten filaments for feedstock gas heating and preionization. A Si͑100͒ wafer was used as a substrate and its surface temperature was measured by a thermocouple and estimated to be ϳ800°C.…”

Section: A Preparation Of Cntps By Pehfcvdmentioning

confidence: 99%

“…A large number of works have reported on the synthesis of CNTPs using various methods. [17][18][19][20][21][22][23][24][25][26] Depending on the specific process conditions and methods used, these nanostuctures reveal various structures such as the carbon-nanotubelike structures, 13 the graphite structure, 14,24 the amorphous structure, 25 the diamondlike structure, 26 as well as several combinations of the above types.…”

Section: Introductionmentioning

confidence: 98%

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Analysis of photoluminescence background of Raman spectra of carbon nanotips grown by plasma-enhanced chemical vapor deposition

Wang

Ostrikov

Tsakadze

et al. 2009

Journal of Applied Physics

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Carbon nanotips with different structures were synthesized by plasma-enhanced hot filament chemical vapor deposition and plasma-enhanced chemical vapor deposition using different deposition conditions, and they were investigated by scanning electron microscopy and Raman spectroscopy. The results indicate that the photoluminescence background of the Raman spectra is different for different carbon nanotips. Additionally, the Raman spectra of the carbon nanotips synthesized using nitrogen-containing gas precursors show a peak located at about 2120 cm−1 besides the common D and G peaks. The observed difference in the photoluminescence background is related to the growth mechanisms, structural properties, and surface morphology of a-C:H and a-C:H:N nanotips, in particular, the sizes of the emissive tips.

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“…18,19,38,39 Here we will discuss the origin of the difference of the Raman spectra generated by different CNTPs and the plain carbon films.…”

Section: Discussionmentioning

confidence: 99%

Section: A Preparation Of Cntps By Pehfcvdmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 98%

See 1 more Smart Citation

Analysis of photoluminescence background of Raman spectra of carbon nanotips grown by plasma-enhanced chemical vapor deposition

Wang

Ostrikov

Tsakadze

et al. 2009

Journal of Applied Physics

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show abstract

“…Due to the bombardment effect of nitrogen-based ions, some carbon atoms in the carbon sheets of the VACNTs are sputtered or displaced by some of the nitrogen-based ions whose energy is close to the binding energy of carbon atoms in the carbon sheets [38]. In this case, the nitrogen-based ions are easily incorporated into the carbon sheets of the nanotubes.…”

Section: Effect Of Nitrogen-based Ion Bombardmentmentioning

confidence: 99%

Enhancement of electron field emission of vertically aligned carbon nanotubes by nitrogen plasma treatment

Wang

Cheng

Chen

et al. 2011

Journal of Alloys and Compounds

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“…[8][9][10][11][12] To date, CNTPs have been successfully synthesized by using plasma-enhanced chemical vapor deposition ͑PECVD͒ with or without catalyst assistance. [16][17][18][19][20][21][22][23] The nanotips can also be formed by plasma-assisted reactive chemical etching through micro-/nanoporous masks. 20,24 It is noteworthy that PECVD systems are widely and commonly employed to synthesize a variety of carbon-based nanomaterials and are regarded as versatile nanofabrication tools.…”

Section: Tailoring Carbon Nanotips In the Plasma-assisted Chemical Vamentioning

confidence: 99%

Tailoring carbon nanotips in the plasma-assisted chemical vapor deposition: Effect of the process parameters

Wang

Ostrikov

2009

Journal of Applied Physics

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Carbon nanotips have been synthesized from a thin carbon film deposited on silicon by bias-enhanced hot filament chemical vapor deposition under different process parameters. The results of scanning electron microscopy indicate that high-quality carbon nanotips can only be obtained under conditions when the ion flux is effectively drawn from the plasma sustained in a CH4+NH3+H2 gas mixture. It is shown that the morphology of the carbon nanotips can be controlled by varying the process parameters such as the applied bias, gas pressure, and the NH3/H2 mass flow ratios. The nanotip formation process is examined through a model that accounts for surface diffusion, in addition to sputtering and deposition processes included in the existing models. This model makes it possible to explain the major difference in the morphologies of the carbon nanotips formed without and with the aid of the plasma as well as to interpret the changes of their aspect ratio caused by the variation in the ion/gas fluxes. Viable ways to optimize the plasma-based process parameters to synthesize high-quality carbon nanotips are suggested. The results are relevant to the development of advanced plasma-/ion-assisted methods of nanoscale synthesis and processing.

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Effects of carbon film roughness on growth of carbon nanotip arrays by plasma-enhanced hot filament chemical vapor deposition

Cited by 20 publications

References 24 publications

Analysis of photoluminescence background of Raman spectra of carbon nanotips grown by plasma-enhanced chemical vapor deposition

Analysis of photoluminescence background of Raman spectra of carbon nanotips grown by plasma-enhanced chemical vapor deposition

Enhancement of electron field emission of vertically aligned carbon nanotubes by nitrogen plasma treatment

Tailoring carbon nanotips in the plasma-assisted chemical vapor deposition: Effect of the process parameters

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