2016
DOI: 10.3103/s1068375516060041
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Effects of annealing on elemental composition and quality of CZTSSe thin films obtained by spray pyrolysis

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Cited by 5 publications
(4 citation statements)
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“…The relatively small grain size appearing in the surface of films can be due to the lack of annealing treatment of the samples at higher temperatures than 350 °C. Many authors have reported an improvement of the crystallinity with the thermal treatment in spray deposited CZTS films [36][37][38]. The XRD patterns of Cu 2 (Zn 1-x Mn x )SnS 4 films synthesized with various mole ratios x = 0; 0.2; 0.4; 0.6; 0.8 and 1 are shown in Fig.…”
Section: Resultsmentioning
confidence: 99%
“…The relatively small grain size appearing in the surface of films can be due to the lack of annealing treatment of the samples at higher temperatures than 350 °C. Many authors have reported an improvement of the crystallinity with the thermal treatment in spray deposited CZTS films [36][37][38]. The XRD patterns of Cu 2 (Zn 1-x Mn x )SnS 4 films synthesized with various mole ratios x = 0; 0.2; 0.4; 0.6; 0.8 and 1 are shown in Fig.…”
Section: Resultsmentioning
confidence: 99%
“…The synthesis of kesterites-based absorber layers in an ambient environment using this technique was first reported by Nakayama in 1997 [121]. Following this work, different reports on the spray pyrolysis technique have been published, where the precursor type, substrate temperature, post thermal treatments and solution pH have been investigated [122][123][124][125]. The substrate temperature in particular, is a key process parameter, as it can influence both the morphology and the stoichiometry of the final film [126].…”
Section: Spray Coatingmentioning
confidence: 99%
“…The S1 precursor was prepared in the similar way to that used for the Cu2ZnSnS4 preparation [27]. To the 17 ml of H2O 2.3 mg of Thiourea (CS(NH2)2) were added.…”
Section: Thin Film Preparationmentioning
confidence: 99%
“…The latter was used for the subsequent deposition of CdS to obtain the p-n junction. To increase the crystalline quality of the films annealing process in an S + Se atmosphere at 525 C for 30 min was performed in accordance with the parameters described for the Ag free system [27]. Note that, similar post-deposition annealing conditions were applied in Refs.…”
Section: Thin Film Preparationmentioning
confidence: 99%