Effects of Annealing and Thickness of Co60Fe20Yb20 Nanofilms on Their Structure, Magnetic Properties, Electrical Efficiency, and Nanomechanical Characteristics

Abstract

X-ray diffraction (XRD) analysis showed that metal oxide peaks appear at 2θ = 47.7°, 54.5°, and 56.3°, corresponding to Yb2O3 (440), Co2O3 (422), and Co2O3 (511). It was found that oxide formation plays an important role in magnetic, electrical, and surface energy. For magnetic and electrical measurements, the highest alternating current magnetic susceptibility (χac) and the lowest resistivity (×10−2 Ω·cm) were 0.213 and 0.42, respectively, and at 50 nm, it annealed at 300 °C due to weak oxide formation. For mechanical measurement, the highest value of hardness was 15.93 GPa at 200 °C in a 50 nm thick film. When the thickness increased from 10 to 50 nm, the hardness and Young’s modulus of the Co60Fe20Yb20 film also showed a saturation trend. After annealing at 300 °C, Co60Fe20Yb20 films of 40 nm thickness showed the highest surface energy. Higher surface energy indicated stronger adhesion, allowing for the formation of multilayer thin films. The optimal condition was found to be 50 nm with annealing at 300 °C due to high χac, strong adhesion, high nano-mechanical properties, and low resistivity.

Studying the Effects of Annealing and Surface Roughness on Both the Magnetic Property and Surface Energy of Co60Fe20Sm20 Thin Films on Si(100) Substrate

“…Conversely, rougher surfaces exhibit higher carrier conductivity, leading to a reduction in electrical resistance. The comparison with other designated materials can be seen in Table 1, including Cobalt Iron Ytterbium (CoFeYb) and Cobalt Iron Yttrium (CoFeY), deposited on Si(100) substrates [55,56]. The information presented in Table 1 highlights that the maximum χac in the current research is lower than observed in Co60Fe20Yb20 and Co60Fe20Y20 materials.…”