2019
DOI: 10.7567/1347-4065/ab14cc
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Effects of amorphous Si on DC electroluminescent devices

Abstract: In order to reduce the driving voltage of DC electroluminescent (EL) devices, an electron injection structure with a hydrogenated amorphous Si (a-Si:H) interlayer between a Ta2O5 layer and ZnS:Mn layer was investigated. It was shown that junction capacitance existed between the Ta2O5 layer and ZnS:Mn layer and that the junction capacitance decreased due to the insertion of the a-Si:H layer. These results were confirmed by impedance spectra. The threshold voltage decreased with the insertion of the a-Si:H layer… Show more

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Cited by 1 publication
(3 citation statements)
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“…The current is limited to less than 1.2 mA in the voltage range below 1 V. This current range agrees with the drive current of the conventional DC-EL device. 15,16) Therefore, the role of current control can be expected also in the DC-EL device with p-Cu 2 O. The current linearly increases with a large forward-bias voltage due to the resistance of Cu 2 O sheet.…”
Section: P-n Junction Propertiesmentioning
confidence: 99%
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“…The current is limited to less than 1.2 mA in the voltage range below 1 V. This current range agrees with the drive current of the conventional DC-EL device. 15,16) Therefore, the role of current control can be expected also in the DC-EL device with p-Cu 2 O. The current linearly increases with a large forward-bias voltage due to the resistance of Cu 2 O sheet.…”
Section: P-n Junction Propertiesmentioning
confidence: 99%
“…The emission threshold voltage is approximately 20 V, which is less than half that of conventional DC-EL devices. 15,16) The average electric field of the emission layer was calculated from V 3 , divided by the film thickness, to confirm whether the hot electrons were generated in the local electric field of the junction. V 3 (98% of V 1 ) was divided into ZnS:Mn and CeO 2, because the resistance of p-Cu 2 O is low.…”
Section: El Propertiesmentioning
confidence: 99%
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