2021
DOI: 10.1016/j.matchar.2021.111448
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Effects of amorphous Co W and Ni W barrier layers on the evolution of Sn/Cu interface

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Cited by 19 publications
(1 citation statement)
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“…[ 10 ] At the same time, intermetallic compounds can also be improved to increase the reliability of solder joints. Chen et al [ 11 ] investigated the diffusion barrier properties of Sn‐Cu joints by electrodepositing Ni, Co, amorphous Ni–W, and amorphous Co–W on a Cu substrate and found that the amorphous Co–W has the best diffusion barrier properties. Liu et al [ 12 ] found that Co–W alloys have good diffusion barrier performance and explored the possibility of replacing the commonly used Ni barrier layer in electronic packaging.…”
Section: Introductionmentioning
confidence: 99%
“…[ 10 ] At the same time, intermetallic compounds can also be improved to increase the reliability of solder joints. Chen et al [ 11 ] investigated the diffusion barrier properties of Sn‐Cu joints by electrodepositing Ni, Co, amorphous Ni–W, and amorphous Co–W on a Cu substrate and found that the amorphous Co–W has the best diffusion barrier properties. Liu et al [ 12 ] found that Co–W alloys have good diffusion barrier performance and explored the possibility of replacing the commonly used Ni barrier layer in electronic packaging.…”
Section: Introductionmentioning
confidence: 99%