Effective surface oxidation of polymer replica molds for nanoimprint lithography

Abstract

In nanoimprint lithography, a surface oxidation process is needed to produce an effective poly(dimethylsiloxane) coating that can be used as an anti-adhesive surface of template molds. However, the conventional photooxidation technique or acidic oxidative treatment cannot be easily applied to polymer molds with nanostructures since surface etching by UV radiation or strong acids significantly damages the surface nanostructures in a short space of time. In this study, we developed a basic oxidative treatment method and consequently, an effective generation of hydroxyl groups on a nanostructured surface of polymer replica molds. The surface morphologies and water contact angles of the polymer molds indicate that this new method is relatively nondestructive and more efficient than conventional oxidation treatments.

High resolution UV roll-to-roll nanoimprinting of resin moulds and subsequent replication via thermal nanoimprint lithography

“…Polysiloxane additives can also render cured resin moulds compatible with fluorinated chlorosilane release agents [18]. Finally, an anti-stick PDMS coating can be applied [44,25]. Note however, that with the latter two techniques the coating itself can modify the critical dimensions beyond the tolerance for sub-50 nm features, depending on the deposition conditions.…”

“…There are various advantages to using flexible resin moulds compared to rigid mould materials. Importantly, flexible resin moulds overcome systemic defects related to thermal expansion mismatch [25]. Such defects can appear in the patterned resist when rigid moulds and substrates of differing materials are utilized at elevated temperature in a thermal nanoimprint process [26].…”

Surface Chemoselective Phototransformation of C–H Bonds on Organic Polymeric Materials and Related High-Tech Applications

“…The physical processes accompanying photooxidation are frequently detrimental and can, for example, damage the fine-patterned polymer nanostructures or lead to cohesive failure during subsequent adhesion. , However, these physical processes accompanying photooxidation have also been deliberately utilized for surface micro/nanostructure fabrication. For example, photooxidation-induced lithography has been used to fabricate chemically functionalized PSt microwells for selective immobilization of gelatin and attachment of stem cells .…”

Restoration Temperature Control through Glass Transition Temperature Modulation of Shape Memory Polymer for Thermally Switchable Adhesive

“…[ 41 , 42 , 43 , 44 , 45 ] Originally developed as an optical adhesive, NOA 63 possesses excellent optical and strong mechanical properties. [ 46 , 47 ] NOA 63 as SMP contains acrylate monomer units with a mercapto‐ester groups in the polymer backbone, making it rubbery enough to conformally contact the substrate when the temperature of the urethane‐related polymer reaches T g . [ 41 ] In particular, NOA 63 offers the ability to program the T g based on curing conditions, enabling rapid and straightforward manufacturing of SMP‐based adhesives via UV irradiation.…”