2004
DOI: 10.1016/j.jcrysgro.2003.10.060
|View full text |Cite
|
Sign up to set email alerts
|

Effective increase of single-crystalline yield during PVT growth of SiC by tailoring of temperature gradient

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
2

Citation Types

1
37
0

Year Published

2005
2005
2021
2021

Publication Types

Select...
4
1

Relationship

1
4

Authors

Journals

citations
Cited by 35 publications
(38 citation statements)
references
References 12 publications
1
37
0
Order By: Relevance
“…Besides, changing the position of the highest temperature relative to growth interface has a great effect on the radial temperature gradient. It has been reported in the literature [23] that the nearer growth interface the position of highest temperature is, the larger the radial temperature gradient, which is thought to be involved in the MDs' formation. It has been reported in Ref.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…Besides, changing the position of the highest temperature relative to growth interface has a great effect on the radial temperature gradient. It has been reported in the literature [23] that the nearer growth interface the position of highest temperature is, the larger the radial temperature gradient, which is thought to be involved in the MDs' formation. It has been reported in Ref.…”
Section: Resultsmentioning
confidence: 99%
“…Here T 3 is the highest temperature, T 2 is larger than T 1 , and T 0 is the lowest temperature in the whole growth chamber. The advantage of such designed temperature field is to enlarge the single crystal region [23]. However, such designed temperature field also result in the non-uniform temperature distribution at the growth front interface of crystal, colder at the center and hotter at the periphery, leading to larger growth rate at the centre than that at the periphery.…”
Section: Resultsmentioning
confidence: 99%
“…In PVT of silicon carbide along the [0001] direction layered growth mode dominates strongly the growth process and the crystal tends to develop (0001) facets. Facet size depends on the position of the facet in respect to the isothermal lines [5].…”
Section: Resultsmentioning
confidence: 99%
“…The reference seed temperature was set to 2200°C in all growth runs. More details on the operation of the growth reactor are given in [5]. Si-face 6H-SiC wafers 35-40 mm in diameter, have been used as seed crystals.…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation