Effective excursion detection and source isolation with defect inspection and classification

Abstract

In this paper, new methodologies for effective process excursion monitoring and defect source isolation are proposed. We introduce new defect classification scheme, in which relevant defect types that are likely to be caused by the same mechanism or source are grouped into a "defect family." We demonstrate that trending by the defect family drastically improves the excursion detection efficiency without suffering noise from irrelevant benign defects. Furthermore we have developed a methodology for identifying the source of the excursion using defect type Pareto. This is based on the fact that the signature of defect type Pareto leads to the defect source information and thus possibly indicates the origin of the problem. Thus both process control and excursion source identification can be achieved simultaneously by effective defect classification.

Hierarchical service analytics for improving productivity in an enterprise service center

“…We anticipate that these results can be generalized further and that their use can be extended into many new domains such as semiconductor manufacturing, aerospace system operation, automotive system design, and network design diagnostics. This expectation is based on prior related work by us in the semiconductor [9], aerospace [5], automotive [6], and networks [8] contexts.…”

Qualitative Diagnosis Method Based on Process History in Semiconductor Manufacturing Process

“…Yuan and Kuo [2008] These methods provide information about the defect but do not indicate how to identify the source of these defects. Close to our study, authors in Shindo et al [1997] and Shindo et al [1999] propose a methodology for identifying the source of defects using defect type Pareto. By grouping a class of defect with the killer class, their result show that it is possible to guess the potential source of the excursion and prioritize the problem fixing procedure.…”

Effective excursion detection by defect type grouping in in-line inspection and classification

“…It is noteworthy that, since our defect grouping scheme is based on the defect generation mechanism/source, the signature of the defect group Pareto leads to the defect source information and thus possibly indicates the origin of the problem. We have developed a methodology for identifying the source of the excursion using the defect type Pareto and intralayer defect propagation probability [11].…”