2020
DOI: 10.1016/j.apsusc.2020.147356
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Effect of VUV radiation and reactive hydrogen atoms on depletion of fluorine from polytetrafluoroethylene surface

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Cited by 21 publications
(16 citation statements)
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“…Furthermore, Vegh et al found out that the Ar + ions cause dehydrogenation and crosslinking of the modified layer because of the preferential sputtering of H atoms relative to C atoms [ 8 ]. Recently, Lojen et al reported the influence of the vacuum ultraviolet (VUV) radiation on the surface kinetics of fluorinated polymers upon plasma treatment [ 9 ]. The recent achievements in the field of plasma–polymer interaction [ 8 , 9 ] enable a detailed explanation of results reported by Duca et al in their pioneer paper [ 6 ].…”
Section: Modification Of Pvdf Surface By Exposure To Argon Plasmamentioning
confidence: 99%
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“…Furthermore, Vegh et al found out that the Ar + ions cause dehydrogenation and crosslinking of the modified layer because of the preferential sputtering of H atoms relative to C atoms [ 8 ]. Recently, Lojen et al reported the influence of the vacuum ultraviolet (VUV) radiation on the surface kinetics of fluorinated polymers upon plasma treatment [ 9 ]. The recent achievements in the field of plasma–polymer interaction [ 8 , 9 ] enable a detailed explanation of results reported by Duca et al in their pioneer paper [ 6 ].…”
Section: Modification Of Pvdf Surface By Exposure To Argon Plasmamentioning
confidence: 99%
“…Recently, Lojen et al reported the influence of the vacuum ultraviolet (VUV) radiation on the surface kinetics of fluorinated polymers upon plasma treatment [ 9 ]. The recent achievements in the field of plasma–polymer interaction [ 8 , 9 ] enable a detailed explanation of results reported by Duca et al in their pioneer paper [ 6 ]. Upon exposure of PVDF to plasma sustained in high-purity argon by capacitively coupled RF discharge, the PVDF material is subjected to both energetic Ar + ions and VUV radiation.…”
Section: Modification Of Pvdf Surface By Exposure To Argon Plasmamentioning
confidence: 99%
“…Hydrogen was introduced into the plasma reactor after achieving the ultimate pressure. Plasma was sustained in hydrogen for 1 s at the pressure of 35 Pa and forward RF power of 600 W. Such a short plasma treatment was used because the hydrogen plasma treatment causes depletion of fluorine from the surface film [27]. OES was used for basic plasma characterization during the polymer treatment with hydrogen plasma.…”
Section: Resultsmentioning
confidence: 99%
“…However, its hydrophobic surface restricting the application in water treatment fields because the pores are not permeable to water. Several surface modification methods have been developed to address this problem, such as sodium-naphthalene treatment 16 high energy ray activation, 17 low temperature plasma-treatment. 18,19 Among these methods, the last one is the most promising strategy for the modification of water treatment ePTFE membranes because it has scarcely no damage to the microstructure of the membrane.…”
Section: Introductionmentioning
confidence: 99%