Effect of total and oxygen partial pressures on structure of photocatalytic TiO2 films sputtered on unheated substrate

A comprehensive study of the influence of the stoichiometry on the physical properties of TiOx films prepared by ion beam deposition

“…17 The TiO 2 films are produced by several methods such as hydrothermal, sol-gel, and by a variety of thin film deposition techniques. 13,18 Among the latest techniques reactive evaporation, 19 magnetron sputtering, [20][21][22][23] chemical vapor deposition, 24 and ion beam enhanced deposition, 25 are the most common routes used for preparing uniform coatings, whereas solution pathways are preferred for catalysts applications, where large areas are required. Also, it is well established that the physical properties of TiO 2 films strongly depend on the oxygen content.…”

“…This limitation is particularly important near the phase transitions from rutile to anatase structures, where minute oxygen partial pressures completely change the result of the reaction. 21,22 In this paper we report a comprehensive study of the crystalline structure and morphology of TiO x films obtained by ion beam deposition ͑IBD͒ in the range of 0.3Ͻ x Ͻ 2. The deposition method, using a Kaufman ion source, allows a precise control of both the ion current density and energy allowing a fine control of the physical properties of the TiO x .…”

Surface Morphological and Electrical Properties of Sputtered Tio2 Thin Films

“…For a long time, TiO 2 thin films have got attention in either as an optical material or as a protective layer for very large scale integrated circuits, because of their high refractive index, excellent optical transmittance and good semiconductor properties (3eV gap), high dielectric constant, very good wear resistance, a high chemical resistance against solvents and acids and stability [1][2][3]. Due to these special properties, TiO 2 has become the subject of many investigations for applications in optical coatings, microelectronic devices and protective layers.…”

Preparation of N-Doped TiO<I><SUB>x</SUB></I> Films as Photocatalyst Using Reactive Sputtering with Dry Air

“…The film thickness, crystal structure, composition, microstructure and defect structure are determined by many factors such as sputtering power, substrate temperature, partial pressures of sputtering gas, sputtering time, and distance from target to substrate. 8,9) However, many studies for N-doped TiO 2 film have focused only on the nitrogen flow ratio. 5,6,10) Meanwhile, many researches have reported the relation between the nitrogen doping and the oxygen deficiency in TiO 2 .…”