1995
DOI: 10.1007/bf01692004
|View full text |Cite
|
Sign up to set email alerts
|

Effect of Ti pretreatment on photoelectric properties of TiO2 layers prepared by plasma-anodic oxidation

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2

Citation Types

0
2
0

Year Published

1995
1995
2003
2003

Publication Types

Select...
3

Relationship

1
2

Authors

Journals

citations
Cited by 3 publications
(2 citation statements)
references
References 10 publications
0
2
0
Order By: Relevance
“…These anodic growth parameters were chosen to produce a thick oxide layer while avoiding its "sparking breakdown," when the layer becomes dull and grey. [10][11] In photocorrosion experiments, direct illumination by a 250-W mercury (Hg) medium-pressure lamp through a tempered glass filter (310 nm) was used. The radiation intensity (~ 100 mW/cm 2 ) was energetically comparable to sunlight irradiation.…”
Section: Introductionmentioning
confidence: 99%
“…These anodic growth parameters were chosen to produce a thick oxide layer while avoiding its "sparking breakdown," when the layer becomes dull and grey. [10][11] In photocorrosion experiments, direct illumination by a 250-W mercury (Hg) medium-pressure lamp through a tempered glass filter (310 nm) was used. The radiation intensity (~ 100 mW/cm 2 ) was energetically comparable to sunlight irradiation.…”
Section: Introductionmentioning
confidence: 99%
“…The barrier prevents the generation of a single spark and thus a point burning of the foil. A relatively homogeneous discharge composed of many constantly moving microsparks spreads in the air gap [4] (the nonconductive barrier causes a low real component of the electric current and disables a discharge performance in DC conditions).…”
Section: Introductionmentioning
confidence: 99%