2019
DOI: 10.1016/j.mssp.2018.12.038
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Effect of thickness and post deposition annealing temperature on the structural and optical properties of thermally evaporated molybdenum oxide films

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Cited by 28 publications
(8 citation statements)
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“…For example, band gap values of 2.4 and 2.7 eV have been reported in reduced MoO3 films although those samples really contained a mix of different MoOx (2 < x < 3) phases. 5 In another report, 3 a band gap of 4.22 eV was found for MoO2 but it cannot be compared with our value since it was determined using = 2 in the Tauc plot (our spectra return a band gap of around 3.5 eV if n is taken as 2). Our result confirms an optical band gap existence for pure MoO2.…”
Section: Transformation From Moo2 To Moo3 By Annealing In Airmentioning
confidence: 46%
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“…For example, band gap values of 2.4 and 2.7 eV have been reported in reduced MoO3 films although those samples really contained a mix of different MoOx (2 < x < 3) phases. 5 In another report, 3 a band gap of 4.22 eV was found for MoO2 but it cannot be compared with our value since it was determined using = 2 in the Tauc plot (our spectra return a band gap of around 3.5 eV if n is taken as 2). Our result confirms an optical band gap existence for pure MoO2.…”
Section: Transformation From Moo2 To Moo3 By Annealing In Airmentioning
confidence: 46%
“…A comprehensive account of the applications of molybdenum oxides can be found elsewhere. 4 Molybdenum oxides prepared with different techniques such as thermal evaporation, 5 sputtering 6,7 or pulsed laser deposition 8 for example, typically referred as MoOx in the literature, are composed by a mixture of different phases. This complicates the task of associating any measured property with a given phase, and has caused a large dispersion in the reported values for some properties of these oxides.…”
Section: Introductionmentioning
confidence: 99%
“…Prior to thin film deposition, the glass substrates were cleaned by usual cleaning protocols as described in our previous work. 39 The second step depicts the chemical etching of as-deposited MoO x thin films. Prior to chemical etching, a 4 mL 25% diluted hydrochloric acid (HCl) was prepared in a glass breaker of 10 mL.…”
Section: Methodsmentioning
confidence: 99%
“…Em relação a isso, é interessante observar que os espectros de transmitância dos filmes depositados nas temperaturas mais altas não possuem as franjas de interferência observadas nos demais espectros, o que é um indicativo de mudança de composição. Como destacado por BORAH et al [15], essas franjas são oriundas da diferença de índice de refração entre o filme e o substrato de vidro soda lime. Dessa forma, visto que os filmes crescidos nas diferentes temperaturas possuem diferentes graus de cristalinidade e de deficiência de oxigênio (os depositados em altas temperaturas são mais cristalinos e menos deficientes de oxigênio), é esperado que eles também possuam diferentes índices de refração, explicando o desaparecimento das franjas de interferência.…”
Section: Efeito Da Potênciaunclassified
“…A transferência das cargas entre as vacâncias de oxigênio e os íons de Mo cria uma vacância de carga positiva que serve como um estado receptor. Além disso, à medida que a temperatura de crescimento do filme aumenta, a densidade dos estados de vacâncias diminui [15].…”
Section: Introductionunclassified