2015
DOI: 10.1016/j.mssp.2015.05.060
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Effect of thermal annealing on the electrical properties of P3HT:PC70BM nanocomposites

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Cited by 20 publications
(11 citation statements)
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“…32 For all blends with P3HT, one major diffraction peak corresponding to the [100] plane was observed 2θ = 5-7°), showing the first-order structure of P3HT with a d spacing of 1.7 nm. 44,45 Pristine films of P3HT:DPP blends exhibit weak XRD peak intensity as compared to annealed samples. The weak intensity observed for pristine films is due to the low-order structure of P3HT.…”
Section: Xrd For Blends Of P3ht and Dpp-rhodanine Derivativesmentioning
confidence: 99%
“…32 For all blends with P3HT, one major diffraction peak corresponding to the [100] plane was observed 2θ = 5-7°), showing the first-order structure of P3HT with a d spacing of 1.7 nm. 44,45 Pristine films of P3HT:DPP blends exhibit weak XRD peak intensity as compared to annealed samples. The weak intensity observed for pristine films is due to the low-order structure of P3HT.…”
Section: Xrd For Blends Of P3ht and Dpp-rhodanine Derivativesmentioning
confidence: 99%
“…During patterning of the PLED and PMemC devices, laser irradiation directly onto the fabricated polymer devices decreased the current density at a given bias. However, there have been many reports where the current density increased with an increase of annealing temperature for devices using polymer Super Yellow and P3HT. , The reasons for the increased current density were investigated and determined to be due to (i) an increase in conductivity arising from the denser film, (ii) a better electrical contact with the bottom electrode attributed to structural changes in the polymer-conjugated backbones, , and (iii) a change in energy level resulting in better charge injection . The contact between the polymer film and the top metal electrode was determined to be independent of the polymer thin film processing condition .…”
Section: Resultsmentioning
confidence: 99%
“…X-ray diffraction (XRD) patterns for the control P3HT:PCBM blend without and with annealing at 110 for 30 minutes ( Figure 4) show one major diffraction peak corresponding to the [100] plane at 2θ = 5-7°, showing the first-order structure of P3HT with a d spacing of 1.7 nm. [43][44] Expectedly, annealing caused an increase in the intensity of the diffaction peak. The weak intensity observed for unannealed films is due to the low-ordered structure of P3HT, whereas thermal annealing at 110 for 30 minutes causes the side chains of P3HT to pack in a more ordered fashion, leading to an increase in crystallinity.…”
Section: Accepted Manuscriptmentioning
confidence: 99%