Strong magnetoresistance effects are often observed in ferromagnet-nonmagnet multilayers, which are exploited in state-of-the-art magnetic field sensing and data storage technologies. In this work we report a novel current-perpendicular-to-plane magnetoresistance effect in multilayer graphene as-grown on catalytic nickel surface by chemical vapor deposition. A negative magnetoresistance effect of ~10 4 % has been observed, which persists even at room temperature. This effect is correlated with the shape of the 2D peak as well as with the occurrence of D peak in the Raman spectrum of the as-grown multilayer graphene. The observed magnetoresistance is extremely high as compared to other known materials systems for similar temperature and field range, and can be qualitatively explained within the framework of "interlayer magnetoresistance" (ILMR).[Keywords: Graphene, Chemical Vapor Deposition, Raman Spectroscopy, Interlayer Magnetoresistance, Current-Perpendicular-to-Plane Transport] 2 Artificial layered structures often exhibit strong magnetoresistance (MR) effects that are exploited in various data storage and magnetic field sensing technologies 1 . Graphite is a naturally occurring layered material in which single graphitic layers (or "graphene") are stacked on each other. Graphene, epitaxially grown on ferromagnets (such as nickel), is particularly attractive for spintronics because such systems can potentially realize perfect spin filtering 2 and giant Rashba splitting 3 . However, CPP (current-perpendicular-toplane) MR properties of such layered graphene/ferromagnet structures are still largely underexplored. Here we consider multilayer-graphene (MLG) as-grown on nickel by chemical vapor deposition (CVD) and show that these structures exhibit large and nearly temperature-independent CPP-MR of ~ 10 4 % for a small magnetic field of ~ 2 kilogauss. This MR effect is correlated with the shape of the 2D peak and also with the occurrence of the D peak in Raman spectrum of as-grown MLG. These Raman features can be controlled by varying the CVD growth parameters. Such large negative CPP-MR, which persists even at room temperature, has hitherto not been reported in any graphitic system 4-14 . Figure 1a shows the device schematic. CVD growth of MLG is performed on 2 cm × 2 cm nickel (Ni) foils, which act as catalyst for graphene growth as well as bottom electrical contact. To ensure uniform current distribution 6 , the second contact is fabricated at the center of the top MLG surface using silver epoxy. Area of the top contact is ~ 1 mm 2 . As shown in Figure S1 (section I, Supplementary Information), the Ni substrate is polycrystalline with primarily (111) grains. Details of the fabrication process are provided in section I of Supplementary Information. Figure 1b shows a FESEM image of the as-grown large-area MLG on Ni. Raman spectra taken from three representative regions of this sample are shown in the top inset of Figure 1b. The top Raman spectrum (black line) is most commonly observed, with few occurren...