Effect of the surface contamination layer on the thickness measurement of ultra-thin HfO2 films

Kim, Tae Gun; Yu, Hyunung; Lee, Seung Mi; Kwak, Gyea Young; Shin, Ji‐Young; Kim, Kyung Joong

doi:10.1016/j.apsusc.2021.148982

Cited by 4 publications

(5 citation statements)

References 17 publications

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“…For the thickness measurement of ultrathin oxide films, mutual calibration method is based on the combination of a ZOM for the compensation of the offset value and a length‐unit traceable method (LTM) for the calibration of the thickness scale traceable to the SI length unit 10–13,15 …”

Section: Theory Of Mutual Calibrationmentioning

confidence: 99%

“…For the thickness measurement of ultrathin oxide films, mutual calibration method is based on the combination of a ZOM for the compensation of the offset value and a length-unit traceable method (LTM) for the calibration of the thickness scale traceable to the SI length unit. [10][11][12][13]15 F I G U R E 1 The offset c, shown as the average and standard deviation of the data in descending order of thickness. 4 F I G U R E 2 Si 2p X-ray photoelectron spectroscopy (XPS) spectra of amorphous SiO 2 films with various thickness on amorphous Si…”

Section: Theory Of Mutual Calibrationmentioning

confidence: 99%

“…The variations of the offset value in the thickness measurement by X-ray photoelectron spectroscopy (XPS) and medium-energy ion scattering spectrometry (MEIS) as a function of the thickness of the carbon layer 15 measurement because the number density of crystalline Si is constant.…”

Section: Medium-energy Ion Scattering Spectrometrymentioning

confidence: 99%

“…This means that MEIS is a unique ZOM for the thickness measurement of ultrathin oxide films of heavy element on Si(100) by mutual calibration method. 15 As a result, the reference thicknesses of four HfO 2 films without the thinnest and thickest films were determined by mutual calibration between the average XRR thicknesses in P-190 and the thicknesses measured MEIS for the same series of specimens. 1, and the offset values were visualized in Figure 1.…”

Section: Introductionmentioning

confidence: 99%

“…However, the variation of offset value in MEIS analysis was negligibly small to be 0.021 nm. This means that MEIS is a unique ZOM for the thickness measurement of ultrathin oxide films of heavy element on Si(100) by mutual calibration method 15 …”

Section: Introductionmentioning

confidence: 99%

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Review on the thickness measurement of ultrathin oxide films by mutual calibration method

Kim

2021

Surface & Interface Analysis

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Mutual calibration was suggested as a method to determine the absolute thickness of ultrathin oxide films. It was motivated from the large offset values in the reported thicknesses in the Consultative Committee for Amount of Substance (CCQM) pilot study P‐38 for the thickness measurement of SiO2 films on Si(100) and Si(111) substrates in 2004. Large offset values from 0.5 to 1.0 nm were reported in the thicknesses by ellipsometry, X‐ray reflectometry (XRR), medium‐energy ion scattering spectrometry (MEIS), Rutherford backscattering spectroscopy (RBS), nuclear reaction analysis (NRA), and transmission electron microscopy (TEM). However, the offset value for the thicknesses by X‐ray photoelectron spectroscopy (XPS) was close to zero (−0.013 nm). From these results, the mutual calibration method was reported for the thickness measurement of SiO2 films on Si(100) by combination of TEM and XPS. The mutual calibration method has been applied for the thickness measurements of hetero oxide films such as Al2O3 and HfO2. Recently, the effect of surface contamination was reported to be critical to the thickness measurement of HfO2 films by XPS. On the other hand, MEIS was proved to be a powerful zero offset method which is not affected by the surface contamination. As a result, the reference thicknesses in the CCQM pilot study P‐190 for the thickness measurement of HfO2 films on Si(100) substrate were determined by mutual calibration method from the average XRR data and MEIS analysis. Conclusively, the thicknesses of ultrathin oxide films can be traceably certified by mutual calibration method and most thickness measurement methods can be calibrated from the certified thicknesses.

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Section: Theory Of Mutual Calibrationmentioning

confidence: 99%