Effect of the sputtering parameters on the physical properties and photocatalytic reactivity of TiO2 thin films prepared by an RF magnetron sputtering deposition method

Fabrication of Pt/Ti/TiO2 Photoelectrodes by RF-Magnetron Sputtering for Separate Hydrogen and Oxygen Production

“…No evidence of the brookite polymorph was ever detected. A similar phase composition has been previously reported for coatings prepared by RF magnetron sputtering at a substrate temperature of 600 °C and Ar pressure of 2.0 Pa [12]. Moreover, the relative intensity of the reflection of the rutile phase at 2θ = 27.5° (corresponding to the (110) reflection) with respect to those at 2θ = 36.1° (101) and 2θ = 54.3° (211) is much larger compared to the reference one reported on top of Figure 2.…”

“…A precise control of all the deposition parameters (RF power, total pressure inside the chamber, deposition time, temperature and distance of the substrate) allows one to tune the characteristics of the deposited film. For example, Ebrahimi et al [ 12 ] showed that the crystal phase composition of a TiO 2 film can be changed from pure rutile to a mixture of anatase and rutile by increasing the total Ar pressure during deposition. In a previous work [ 4 ], we showed that almost pure anatase is obtained by keeping the substrate temperature at 450 °C, whereas prevalently rutile is obtained at 600 °C.…”

Nanoscale TiO2 films and their application in remediation of organic pollutants

“…These methods include sol-gel, chemical vapor deposition, hydrothermal, electrophoretic deposition, flame-aerosol, sputtering deposition, and spray pyrolysis [27,84,92,[107][108][109][110][111]. Below, each method is summarized for the preparation of photocatalyst nanoparticles and thin films of TiO 2 while Table 1 summarizes the relative merits and demerits of each technique for comparative purposes.…”